Comparative Study on Excitation Temperature, Electron Temperature and Electron Density in an Atmospheric Argon Microwave Plasma

被引：0
|
作者：
Wang Zhong [1 ]
Zhang Gui-Xin [1 ]
Liu Cheng [1 ]
Jia Zhi-Dong [1 ]
机构：
[1] Tsinghua Univ, Dept Elect Engn, Beijing 100084, Peoples R China
来源：
CHINESE PHYSICS LETTERS | 2014年 / 31卷 / 05期
关键词：
PRESSURE; LINES;
D O I：
10.1088/0256-307X/31/5/055203
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
An infinite-volume of atmospheric argon microwave plasma is produced in the microwave plasma source based on the inductive coupling window-rectangular resonator under the input of the microwave power at 2.45 GHz. The excitation temperature of the plasma is studied by using the Boltzmann plot of Ar I lines in two different wavelength ranges while the electron temperature is researched by using line-to-continuum intensity ratio of Ar I lines. The electron density is compared by using the Stark broadenings of Ar I lines at 522.13nm and 549.59nm and H-beta line at 486.13 nm.
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页数：3
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