Nano-structured thin films characterized by high-temperature X-ray diffraction

被引：0
|
作者：
Keckes, J. [1 ,2 ]
机构：
[1] Austrian Acad Sci, Erich Schmid Inst, Leoben, Austria
[2] Univ Leoben, Dept Mat Phys, Leoben, Austria
来源：
ACTA CRYSTALLOGRAPHICA A-FOUNDATION AND ADVANCES | 2007年 / 63卷
关键词：
thin film analysis; stress analysis; in-situ temperature diffraction;
D O I：
10.1107/S0108767307098030
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
MS37 O3
引用
收藏
页码：S89 / S90
页数：2
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