Wafer Level Recombination Carrier Lifetime Measurements of 4H-SiC PiN Epitaxial Wafers

被引:2
|
作者
Chung, G. [1 ]
Loboda, M. J. [1 ]
MacMillan, M. F. [1 ]
Wan, J. W. [1 ]
机构
[1] Dow Corning Compound Semicond Solut LLC, Midland, MI 48611 USA
来源
关键词
recombination lifetime; 4H-SiC; PiN structure; microwave microwave-PCD; HCl gas etching; disruptive growth; DIODES;
D O I
10.4028/www.scientific.net/MSF.615-617.287
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Effective recombination lifetimes of 4H-SiC PiN epitaxy wafers are measured by mu-PCD (microwave photoconductive decay) system at wafer level. Lifetimes measured in presence and absence of the p(+) layer show lower lifetime values with p(+) layer present. This is attributed to high recombination rate at p(+)/n(-) interface. Lifetimes at various buffer thicknesses show lower values at the buffer layer of about 50 mu m due to high interface recombination rate resulting from rougher surface of the buffer layer. Lifetimes of PiN wafers from interrupted and Continuous p+/n- growth are very comparable.
引用
收藏
页码:287 / 290
页数:4
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