Simulations of faceted polycrystalline thin films: Asymptotic analysis

被引：15
|
作者：
Ophus, Colin [1 ]
Luber, Erik
Mitlin, David
机构：
[1] Univ Alberta, Dept Chem & Mat Engn, Edmonton, AB, Canada
来源：
ACTA MATERIALIA | 2009年 / 57卷 / 05期
基金：
加拿大自然科学与工程研究理事会;
关键词：
Thin film growth; Computer simulation; Grain morphology; Chemical vapor deposition; GROWTH; TEXTURE;
D O I：
10.1016/j.actamat.2008.11.014
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
We have used a level set construction to simulate the growth of faceted polycrystalline thin films in 2 + 1 dimensions using the van der Drift model. The evolution of several different crystal geometries into their self-similar late-Stage surfaces is described. Each simulation resulted in a columnar microstructure and growth statistics including grain diameter and area, RMS surface roughness and surface texture were collected at each time step. We describe the dependence of each of these statistical measures upon the crystal geometry. (C) 2008 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.
引用
收藏
页码：1327 / 1336
页数：10
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