Novel tantalum amido precursors for CBD/ALD of advanced barrier thin films.

被引：0
|
作者：
Chen, TN [1 ]
Xu, CY [1 ]
Baum, TH [1 ]
机构：
[1] ATMI Inc, Danbury, CT 06810 USA
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 2004年 / 228卷
关键词：
D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
564-INOR
引用
收藏
页码：U865 / U865
页数：1
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