Novel tantalum amido precursors for CBD/ALD of advanced barrier thin films.

被引：0
|
作者：
Chen, TN [1 ]
Xu, CY [1 ]
Baum, TH [1 ]
机构：
[1] ATMI Inc, Danbury, CT 06810 USA
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 2004年 / 228卷
关键词：
D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
564-INOR
引用
收藏
页码：U865 / U865
页数：1
相关论文
共 50 条
  • [1] New Tantalum Amido Complexes with Chelate Ligands as Metalorganic (MO) Precursors for Chemical Vapor Deposition (CVD) of Tantalum Nitride Thin Films
    Chen, Tianniu
    Xu, Chongying
    Baum, Thomas H.
    Stauf, Gregory T.
    Roeder, Jeffrey F.
    DiPasquale, Antonio G.
    Rheingold, Arnold L.
    CHEMISTRY OF MATERIALS, 2010, 22 (01) : 27 - 35
  • [2] Novel precursors for the chemical vapor deposition of Group 13 oxynitride thin films.
    Miller, DO
    Vohs, JK
    Fahlman, BD
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2004, 227 : U1517 - U1517
  • [3] Novel CVD precursors for alkaline earth metal oxide containing thin films.
    Paw, W
    Baum, TH
    Liable-Sands, LM
    Rheingold, AL
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1998, 216 : U148 - U148
  • [4] Characteristics of ALD-TaN thin films using a novel precursors for copper metallization
    Choi, KI
    Kim, BH
    Lee, SW
    Lee, JM
    Song, WS
    Choi, GH
    Chung, UI
    Moon, JT
    PROCEEDINGS OF THE IEEE 2003 INTERNATIONAL INTERCONNECT TECHNOLOGY CONFERENCE, 2003, : 129 - 131
  • [5] INFLUENCE OF ION BOMBARDMENT ON THE DISTRIBUTION OF IMPURITIES IN THIN TANTALUM FILMS.
    Belyi, I.M.
    Komarov, F.F.
    Moroshkin, N.V.
    Soviet physics. Technical physics, 1980, 25 (12): : 1534 - 1538
  • [6] Breakdown and Protection of ALD Moisture Barrier Thin Films
    Nehm, Frederik
    Klumbies, Hannes
    Richter, Claudia
    Singh, Aarti
    Schroeder, Uwe
    Mikolajick, Thomas
    Moench, Tobias
    Hossbach, Christoph
    Albert, Matthias
    Bartha, Johann W.
    Leo, Karl
    Mueller-Meskamp, Lars
    ACS APPLIED MATERIALS & INTERFACES, 2015, 7 (40) : 22121 - 22127
  • [7] Novel mixed alkylamido-cyclopentadienyl precursors for ALD of ZrO2 thin films
    Niinisto, Jaakko
    Kukli, Kaupo
    Kariniemi, Maarit
    Ritala, Mikko
    Leskela, Markku
    Blasco, Nicolas
    Pinchart, Audrey
    Lachaud, Christophe
    Laaroussi, Nadia
    Wang, Ziyun
    Dussarrat, Christian
    JOURNAL OF MATERIALS CHEMISTRY, 2008, 18 (43) : 5243 - 5247
  • [8] Growth and phase stabilization of HfO2 thin films by ALD using novel precursors
    Niinisto, Jaakko
    Mantymaki, Miia
    Kukli, Kaupo
    Costelle, Leila
    Puukilainen, Esa
    Ritala, Mikko
    Leskela, Markku
    JOURNAL OF CRYSTAL GROWTH, 2010, 312 (02) : 245 - 249
  • [9] New ALD and MOCVD metal precursors for transparent oxide thin films
    Chung, Taek-Mo
    Kim, Chang Gyoun
    Jung, Inkyung
    Park, Bo Keun
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2010, 240
  • [10] NOVEL LINEAR EVAPORATOR FOR VLSI THIN FILMS.
    Anon
    IBM technical disclosure bulletin, 1985, 28 (01): : 184 - 186
12345