Application of radio frequency inductively coupled plasma in chemical vapor deposition process of diamond-like carbon films for modification of properties of deposited films

被引：3
|
作者：
Kijaszek, Wojciech [1 ]
Oleszkiewicz, Waldemar [1 ]
Znamirowski, Zbigniew [1 ]
机构：
[1] Wroclaw Univ Sci & Technol, Fac Microsyst Elect & Photon, Janiszewskiego 11-17, PL-50372 Wroclaw, Poland
来源：
MATERIALS SCIENCE-POLAND | 2018年 / 36卷 / 01期
关键词：
diamond-like carbon; RF ICP PECVD; Raman scattering spectroscopy; field emission; FIELD-EMISSION; AMORPHOUS-CARBON; DLC COATINGS; RAMAN;
D O I：
10.1515/msp-2017-0119
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The authors have deposited the diamond-like carbon (DLC) films by radio frequency inductively coupled plasma enhanced chemical vapor deposition (RF ICP PECVD) method. The investigated DLC films with different sp(3) fraction content were deposited on polished and textured silicon substrates. The sp(3) fraction content of the deposited DLC films was ranging from 35 % to 70 % and was estimated from acquired Raman scattering spectra (excitation wavelength: 325 nm and 514.5 nm). The measurements of field emission characteristics were carried out in diode configuration. Emission properties of the DLC films were calculated from Fowler-Nordheim plots. The calculated electric field enhancement factor films was ranging from 56 to 198 for the DLC films deposited on polished substrates and from 115 to 445 for films deposited on textured substrates. The surface of the DLC films was observed by scanning electron microscope (SEM) after field emission measurements. The acquired SEM images reveled that the activation of field emission from the DLC films is connected with generation of structural damage to the DLC films.
引用
收藏
页码：80 / 85
页数：6
相关论文
共 50 条
  • [31] Plasma enhanced chemical vapor deposition of 'diamond-like' carbon films from fluorinated feeds
    d'Agostino, R.
    Lamendola, R.
    Favia, P.
    Polymer Preprints, Division of Polymer Chemistry, American Chemical Society, 1993, 34 (01):
  • [32] Characterization of diamond-like carbon films formed by magnetically enhanced plasma chemical vapor deposition
    Inagawa, K
    Zeniya, T
    Hibino, N
    SURFACE & COATINGS TECHNOLOGY, 2003, 169 : 344 - 347
  • [33] Synthesis of diamond-like carbon films by nanopulse plasma chemical vapor deposition in open air
    Kondo, Y
    Saito, T
    Terazawa, T
    Saito, M
    Ohtake, N
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 2005, 44 (50-52): : L1573 - L1575
  • [34] X-ray reflectometry study of diamond-like carbon films prepared by plasma enhanced chemical vapor deposition in a low pressure inductively coupled plasma
    Salah, F.
    Harzallah, B.
    van der Lee, A.
    Angleraud, B.
    Begou, T.
    Granier, A.
    THIN SOLID FILMS, 2013, 537 : 102 - 107
  • [35] Magnetron plasma-enhanced chemical vapor deposition of diamond-like carbon thin films
    Anita, V
    Saito, N
    Takai, O
    THIN SOLID FILMS, 2006, 506 : 63 - 67
  • [36] Synthesis of diamond-like carbon films by nanopulse plasma chemical vapor deposition at subatmospheric pressure
    Ohtake, N
    Saito, T
    Kondo, Y
    Hosono, S
    Nakamura, Y
    Imanishi, Y
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 2004, 43 (11A): : L1406 - L1408
  • [37] GROWTH OF DIAMOND-LIKE FILMS BY DC PLASMA CHEMICAL VAPOR-DEPOSITION
    ZHAN, RJ
    GAO, KL
    ZOU, ZP
    WANG, YX
    LIU, JZ
    XIANG, ZL
    LIU, HT
    WU, ZQ
    YE, J
    ZHOU, G
    WANG, CS
    CHINESE PHYSICS LETTERS, 1990, 7 (10): : 445 - 448
  • [38] E and H regimes of plasma enhanced chemical vapor deposition of diamond-like carbon film in low frequency inductively coupled plasma reactor
    Sun, Z
    Xu, S
    Ostrikov, KN
    DIAMOND AND RELATED MATERIALS, 2002, 11 (01) : 92 - 97
  • [39] Study of polycrystalline silicon films deposited by inductively coupled plasma chemical vapor deposition
    Won, SH
    Youn, JH
    Jang, J
    Moon, BY
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2001, 39 (01) : 123 - 126
  • [40] The effect of the substrate bias voltage and the deposition pressure on the properties of diamond-like carbon produced by inductively coupled plasma assisted chemical vapor deposition
    Kim, H
    Jung, DH
    Park, B
    Yoo, KC
    Lee, JJ
    Joo, JH
    SURFACE & COATINGS TECHNOLOGY, 2005, 193 (1-3): : 255 - 258
12345