Simulation by COMSOL of Effects of Probe on Inductively Coupled Argon Plasma

被引:4
|
作者
Shahbazian, A. [1 ]
Salem, M. K. [1 ]
Ghoranneviss, M. [1 ]
机构
[1] Islamic Azad Univ, Sci & Res Branch, Plasma Phys Res Ctr, Tehran, Iran
关键词
ICP; Inductively coupled plasma; Simulation; COMSOL; Plasma;
D O I
10.1007/s13538-020-00821-3
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
A new system is simulated to find the effects of the presence of any impurities or different devices, such as different probes along the plasma path in the torque, on plasma parameters such as electron density, electric potential, pressure, and temperature. A torque with two coils of equal size and a probe between them is simulated by the inductively coupled plasma (ICP) module in the COMSOL simulation program. Two modes are considered in the tunnel, the most important is the presence and absence of probe between the two coils. The results and measurements are compared and presented as figures and diagrams. The main outcomes reveal that the presence of any probe, even with the slightest penetration of the plasma edge, can affect the properties of the plasma. Software simulation is one of the fastest ways to get results at the least cost. In more advanced work in the future, it is possible to investigate the existence of several probes of different sizes as well as the effect of temperature fluctuations on the plasma.
引用
收藏
页码:351 / 360
页数:10
相关论文
共 50 条
  • [1] Simulation by COMSOL of Effects of Probe on Inductively Coupled Argon Plasma
    A. Shahbazian
    M. K. Salem
    M. Ghoranneviss
    [J]. Brazilian Journal of Physics, 2021, 51 : 351 - 360
  • [2] Fast and reliable simulations of argon inductively coupled plasma using COMSOL
    Brezmes, Angel Ochoa
    Breitkopf, Cornelia
    [J]. VACUUM, 2015, 116 : 65 - 72
  • [3] Simulation of inductively coupled plasma with applied bias voltage using COMSOL
    Brezmes, Angel Ochoa
    Breitkopf, Cornelia
    [J]. VACUUM, 2014, 109 : 52 - 60
  • [4] Simulation of inductively coupled plasma with applied bias voltage using COMSOL
    Ochoa Brezmes, Angel
    Breitkopf, Cornelia
    [J]. Vacuum, 2014, 109 : 52 - 60
  • [5] Simulation of inductively coupled plasma with applied bias voltage using COMSOL
    [J]. Ochoa Brezmes, A. (ochoabrez@hotmail.com), 1600, Elsevier Ltd (109):
  • [6] Effects of the Nonequilibrium Model and the Discharge Frequency on an Argon Inductively Coupled Plasma Simulation
    Yu, Minghao
    Ma, Libin
    Liu, Kai
    [J]. JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2019, 75 (02) : 131 - 137
  • [7] Effects of the Nonequilibrium Model and the Discharge Frequency on an Argon Inductively Coupled Plasma Simulation
    Minghao Yu
    Libin Ma
    Kai Liu
    [J]. Journal of the Korean Physical Society, 2019, 75 : 131 - 137
  • [8] Comparison between experiment and simulation for argon inductively coupled plasma
    Gao, Fei
    Zhao, Shu-Xia
    Li, Xiao-Song
    Wang, You-Nian
    [J]. PHYSICS OF PLASMAS, 2009, 16 (11) : 113502
  • [9] Effects of magnetic fields on a planar inductively coupled argon plasma
    Seoul Natl Univ, Seoul, Korea, Republic of
    [J]. Plasma Sources Sci Technol, 3 (383-388):
  • [10] The effects of magnetic fields on a planar inductively coupled argon plasma
    Lee, HJ
    Yang, ID
    Whang, KW
    [J]. PLASMA SOURCES SCIENCE & TECHNOLOGY, 1996, 5 (03): : 383 - 388