Digitally alloyed ZnO and TiO2 thin film thermistors by atomic layer deposition for uncooled microbolometer applications

被引：2
|
作者：
Tilkioglu, Bilge T. [1 ]
Bolat, Sami [2 ]
Tanrikulu, Mahmud Yusuf [3 ]
Okyay, Ali Kemal [1 ,2 ]
机构：
[1] Bilkent Univ, Inst Mat Sci & Nanotechnol, TR-06800 Ankara, Turkey
[2] Bilkent Univ, Dept Elect & Elect Engn, Natl Nanotechnol Res Ctr, UNAM, TR-06800 Ankara, Turkey
[3] Adana Sci & Technol Univ, Dept Elect & Elect Engn, TR-01180 Adana, Turkey
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 2017年 / 35卷 / 02期
关键词：
TRANSITION; OXIDATION; CATALYSTS;
D O I：
10.1116/1.4976513
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
The authors demonstrate the digital alloying of ZnO and TiO2 via atomic layer deposition method to be utilized as the active material of uncooled microbolometers. Depositions are carried out at 200 degrees C. Crystallinity of the material is shown to be degraded with the increase of the Ti content in the grown film. A maximum temperature coefficient of resistance (TCR) of 5.96%/K is obtained with the films containing 12.2 at. % Ti, and the obtained TCR value is shown to be temperature insensitive in the 15-22 degrees C, thereby allowing a wide range of operation temperatures for the low cost microbolometers. (C) 2017 American Vacuum Society.
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页数：4
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