Effects of Ga Supply on the Growth of (11-22) AlN on m-Plane (10-10) Sapphire Substrates

被引:10
|
作者
Jo, Masafumi [1 ]
Hirayama, Hideki [1 ]
机构
[1] RIKEN, 2-1 Wako, Wako, Saitama 3510198, Japan
来源
关键词
AlN; crystal growth; gallium; MOCVD; sapphire; semipolar surfaces; 11(2)OVER-BAR2 AIN; MOVPE GROWTH; HETEROSTRUCTURES;
D O I
10.1002/pssb.201700418
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Flat and high-quality semipolar AlN layers are crucial to realizing polarization-reduced deep-UV optical devices. We investigate the effects of Ga supply during the growth of semipolar AlN on m-plane sapphire with the aim to produce better surface morphology. Incorporation of Ga into AlN is negligibly small at high-temperature growth. The surface roughness significantly decreased with increasing the TMGa flow at a constant V/III ratio.
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页数:4
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