Transparent, conductive CuI films prepared by rf-dc coupled magnetron sputtering

被引：82

作者：

Tanaka, T ^{[1
]}

Kawabata, K ^{[1
]}

Hirose, M ^{[1
]}

机构：

[1] HIROSHIMA UNIV, DEPT ELECT ENGN, HIGASHIHIROSHIMA 724, JAPAN

来源：

THIN SOLID FILMS | 1996年 / 281卷

关键词：

copper; sputtering; X-ray photoelectron spectroscopy;

D O I：

10.1016/0040-6090(96)08607-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Optically transparent, conducting CuI films have been prepared by a magnetron sputtering technique which employs rf and dc target biases. It is shown that the stoichiometric CuI films are obtained at the target bias V-T=-200 V, while the lowest resistivity of 5.4X10(-2) Ohm cm and the best optical transmittance of about 70% over the wavelength range 500 to 1000 nm are obtained at V-T=-50 V where the I/Cu ratio is 0.9.

引用

页码：179 / 181

页数：3

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