Preparation of a CVD thin film by an atmospheric pressure low temperature surface discharge plasma torch

被引：9
|
作者：
Kuwabara, Atsushi [1 ]
Kuroda, Shin-ichi [1 ]
Kubota, Hitoshi [1 ]
机构：
[1] Gunma Univ, Fac Engn, Dept Chem, Gunma 3768515, Japan
来源：
PLASMA SOURCES SCIENCE & TECHNOLOGY | 2006年 / 15卷 / 03期
关键词：
D O I：
10.1088/0963-0252/15/3/005
中图分类号：
O35 [流体力学]; O53 [等离子体物理学];
学科分类号：
070204 ; 080103 ; 080704 ;
摘要：
We describe the preparation of a chemical vapour deposition (CVD) thin film using the low temperature surface discharge plasma torch of our previous paper, and examine the influences of preparation distance, applied voltage and preparation time on the thin film structure. The composition of the obtained CVD thin film was altered by the applied voltage and preparation distance, and it was made from an inorganic composition with a state of SiO2 under a high-applied voltage and long preparation distance.
引用
收藏
页码：328 / 331
页数：4
相关论文
共 50 条
  • [1] Development of atmospheric pressure low temperature surface discharge plasma torch and application to polypropylene surface treatment
    Kuwabara, Atsushi
    Kuroda, Shin-ichi
    Kubota, Hitoshi
    PLASMA CHEMISTRY AND PLASMA PROCESSING, 2008, 28 (02) : 263 - 271
  • [2] Development of Atmospheric Pressure Low Temperature Surface Discharge Plasma Torch and Application to Polypropylene Surface Treatment
    Atsushi Kuwabara
    Shin-ichi Kuroda
    Hitoshi Kubota
    Plasma Chemistry and Plasma Processing, 2008, 28 : 263 - 271
  • [3] THIN-FILM PREPARATION BY PLASMA AND LOW-PRESSURE CVD IN A HORIZONTAL REACTOR
    MOROSANU, CE
    SOLTUZ, V
    VACUUM, 1981, 31 (07) : 309 - 313
  • [4] Barrier-torch discharge plasma source for surface treatment technology at atmospheric pressure
    Hubicka, Z
    Cada, M
    Sícha, M
    Churpita, A
    Pokorny, P
    Soukup, L
    Jastrabík, L
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2002, 11 (02): : 195 - 202
  • [5] Atmospheric-pressure low-temperature plasma processes for thin film deposition
    Kakiuchi, Hiroaki
    Ohmi, Hiromasa
    Yasutake, Kiyoshi
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2014, 32 (03):
  • [6] Comparison of the barrier torch discharge and torch discharge at atmospheric pressure
    Brablec, A
    Slavícek, P
    Klíma, M
    Kapicka, V
    Behnke, JF
    Sícha, M
    CZECHOSLOVAK JOURNAL OF PHYSICS, 2002, 52 : 561 - 566
  • [7] Polymer surface treatment by atmospheric pressure low temperature surface discharge plasma: Its characteristics and comparison with low pressure oxygen plasma treatment
    Kuwabara, Atsushi
    Kuroda, Shin-ichi
    Kubota, Hitoshi
    PLASMA SCIENCE & TECHNOLOGY, 2007, 9 (02) : 181 - 189
  • [8] Polymer Surface Treatment by Atmospheric Pressure Low Temperature Surface Discharge Plasma:Its Characteristics and Comparison with Low Pressure Oxygen Plasma Treatment
    AtsushiKUWABARA
    Shin-ichiKURODA
    HitoshiKUBOTA
    Plasma Science and Technology, 2007, 9 (02) : 181 - 189
  • [9] Polymer Surface Treatment by Atmospheric Pressure Low Temperature Surface Discharge Plasma:Its Characteristics and Comparison with Low Pressure Oxygen Plasma Treatment
    AtsushiKUWABARA
    Shin-ichiKURODA
    HitoshiKUBOTA
    Plasma Science and Technology, 2007, (02) : 181 - 189
  • [10] Temperature measurement of an atmospheric-pressure plasma torch
    Kuo, SP
    Koretzky, E
    Vidmar, RJ
    REVIEW OF SCIENTIFIC INSTRUMENTS, 1999, 70 (07): : 3032 - 3034
12345