Defect printability and repair of alternating phase shift masks

被引：0

作者：

Friedrich, C ^{[1
]}

Verbeek, M ^{[1
]}

Mader, L ^{[1
]}

Crell, C ^{[1
]}

Pforr, R ^{[1
]}

Griesinger, UA ^{[1
]}

机构：

[1] Infineon Technol, D-81609 Munich, Germany

来源：

16TH EUROPEAN CONFERENCE ON MASK TECHNOLOGY FOR INTEGRATED CIRCUITS AND MICROCOMPONENTS | 2000年 / 3996卷

关键词：

alternating phase shift mask; defect printability; repair;

D O I：

10.1117/12.377104

中图分类号：

TP3 [计算技术、计算机技术];

学科分类号：

0812 ;

摘要：

This paper will start with an overview of the different defect types which can occur on alternating phase shifting masks. A test mask with programmed defects of these different types was fabricated. The defect printability was investigated using an AIMS system. These results were correlated to first printing results in the wafer-fab. The results give an overview of the requirements for an inspection and repair system for alternating phase shifting masks. In order to get a better understanding of this printability behaviour first simulations of defects using a 3-D mask simulation tool were carried out and compared to the measurements. Several examples of quartz-repairs with different qualities are presented together with the influence on the aerial image.

引用

页码：8 / 19

页数：12

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