The molecular structure and ionization potential of Si2:: The role of the excited states in the photoionization of Si2

被引:30
|
作者
Dixon, DA
Feller, D
Peterson, KA
Gole, JL
机构
[1] Pacific NW Natl Lab, Environm Mol Sci Lab, Richland, WA 99352 USA
[2] Washington State Univ, Dept Chem, Richland, WA 99352 USA
[3] Georgia Inst Technol, Sch Phys, Atlanta, GA 30332 USA
来源
JOURNAL OF PHYSICAL CHEMISTRY A | 2000年 / 104卷 / 11期
关键词
D O I
10.1021/jp992078b
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The ionization potentials (IP) of Si-2 (X (3)Sigma(g)(-)) to form the X (4)Sigma(g)(-) and a(2)Pi(u) states of Si-2(+) have been calculated at very high levels of ab initio molecular orbital theory (CCSD(T) with augmented correlation-consistent basis sets extrapolated to the complete basis set limit). The calculated value of the IP to form the X (4)Sigma(g)(-) ground state of the ion is 7.913 eV as compared to an experimental value of 7.9206 eV. The a(2)Pi(u) stare is predicted to lie 0.52 eV above the X (4)Sigma(g)(-) ground state of Si-2(+). The 1 (3)Delta(u), 2 (3)Delta(u), H (3)Sigma(u)(-), and K (3)Sigma(u)(-) excited states of Si-2, as well as the X (4)Sigma(g)(-), a(2)Pi(u), and 2(2)Pi(u) states of Si-2(+), have been calculated at the multireference configuration interaction level. The agreement of the calculated positions of the states with the known experimental values is quite good (better than 0.1 eV. The calculated wave functions fur the excited states of Si-2 show significant multireference character. This is especially true for the H state which has been used as an intermediate state in photoionization experiments. The multireference character of the H state readily allows the connection of this state to the ground X (4)Sigma(g)(-) electronic state of Si-2(+) via a one electron photoionization process.
引用
收藏
页码:2326 / 2332
页数:7
相关论文
共 50 条
  • [41] ABSORPTION SPECTRUM OF SI2 IN VISIBLE AND NEAR-ULTRAVIOLET REGION
    DUBOIS, I
    LECLERCQ, H
    CANADIAN JOURNAL OF PHYSICS, 1971, 49 (23) : 3053 - &
  • [42] SUB-ATOMIC-LAYER EPITAXY OF SI USING SI2 H-6
    SUDA, Y
    ISHIDA, M
    YAMASHITA, M
    IKEDA, H
    APPLIED SURFACE SCIENCE, 1994, 82-3 : 332 - 337
  • [43] Magnetic phase diagram of Ce(CuxRh1-x)2 Si2
    Pedrazzini, P
    Berisso, MG
    Sereni, JG
    Trovarelli, O
    Geibel, C
    JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, 2001, 226 : 161 - 163
  • [44] Stratospheric intrusion index (SI2) from baseline measurement data
    P. Cristofanelli
    F. Calzolari
    U. Bonafè
    R. Duchi
    A. Marinoni
    F. Roccato
    L. Tositti
    P. Bonasoni
    Theoretical and Applied Climatology, 2009, 97 : 317 - 325
  • [45] HARTREE-FOCK-LIMIT PROPERTIES FOR SIC, SIN, SI2, SI-2STAR AND SIS
    MULLERPLATHE, F
    LAAKSONEN, L
    CHEMICAL PHYSICS LETTERS, 1989, 160 (02) : 175 - 182
  • [46] Tight-binding calculation:: Electronic structure of (BeSe)n/(Si2)m superlattices
    Zhu, LQ
    Wang, EG
    Zhang, LY
    PHYSICA STATUS SOLIDI B-BASIC RESEARCH, 1997, 204 (02): : 643 - 651
  • [47] Secondary ion emissions from carbon nanotubes induced by MeV Si and Si2 clusters
    Ding, FR
    Shi, P
    He, WH
    Wang, Y
    Nie, R
    Shen, DY
    Ma, HJ
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2004, 217 (04): : 572 - 577
  • [48] Electron impact ionization cross-section of C2, C3, Si2, Si3, SiC, SiC2 and Si2C
    Naghma, Rahla
    Antony, Bobby
    MOLECULAR PHYSICS, 2013, 111 (02) : 267 - 273
  • [49] Magnetic properties of Pr Cr2 Si2 C single crystal
    Janatova, Marcela
    Vejpravova, Jana Poltierova
    Divis, Martin
    Journal of Applied Physics, 2009, 105 (07):
  • [50] LUMNGE2, A NEW STRUCTURAL TYPE RELATED TO THOSE OF TIMN(FE)SI2, ZRMNSI2 AND ZRFESI2 - SCMNGE2, A NEW ISOTOPE OF TIMN(FE)SI2
    MEYER, M
    VENTURINI, G
    MALAMAN, B
    STEINMETZ, J
    ROQUES, B
    MATERIALS RESEARCH BULLETIN, 1983, 18 (12) : 1529 - 1535