Qualitative X-ray diffraction analysis of residual stresses in NdNiO3 thin films with metal-insulator transition

被引：3
|
作者：
Zaghrioui, M
Laffez, P
Goudeau, P
Thiaudière, D
机构：
[1] Univ Maine, Lab Phys Etat Condense, CNRS, UMR 6087, F-72085 Le Mans, France
[2] Univ Tours, Lab Electrodynam mat Avances, CNRS, FRE 2077, F-37200 Tours, France
[3] Univ Poitiers, Met Phys Lab, CNRS, UMR 6630, F-86962 Futuroscope, France
[4] Univ Paris 11, Utilisat Rayonnement Electromagnet Lab, CNRS, UMR 130, F-91898 Orsay, France
来源：
JOURNAL OF MATERIALS SCIENCE LETTERS | 2002年 / 21卷 / 17期
关键词：
D O I：
10.1023/A:1019781019560
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
NdNiO3 thin films deposited on Si(100) showed in plane macro residual stress in tension, and that the stress magnitude is more important in the textured sample than in the isotropic one. This study allowed to validate the hypothesis concerning the possible influence of residual stresses in NdNiO3 films on TMI.
引用
收藏
页码：1379 / 1383
页数：5
相关论文
共 50 条
  • [1] X-ray diffraction investigation of the relationship between strains and metal-insulator transition in NdNiO3 thin films
    Goudeau, P
    Laffez, P
    Zaghrioui, A
    Elkaim, E
    Ruello, P
    CRYSTAL ENGINEERING, 2002, 5 (3-4) : 317 - 325
  • [2] Tuning the Metal-Insulator transition in NdNiO3 thin films
    Shiyani, T.
    Shekhada, K. G.
    Savaliya, C. R.
    Markna, J. H.
    FUNCTIONAL OXIDES AND NANOMATERIALS, 2017, 1837
  • [3] Raman study of metal-insulator transition in NdNiO3 thin films
    Zaghrioui, M
    Bulou, A
    Laffez, P
    Lacorre, P
    JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, 2000, 211 (1-3) : 238 - 242
  • [4] Metal-insulator transitions in NdNiO3 thin films
    Catalan, G
    Bowman, RM
    Gregg, JM
    PHYSICAL REVIEW B, 2000, 62 (12) : 7892 - 7900
  • [5] Microstructure and metal-insulator transition of NdNiO3 thin films on various substrates
    Laffez, P.
    Zaghrioui, M.
    Monot, I.
    Brousse, T.
    Lacorre, P.
    Thin Solid Films, 1999, 354 (01): : 50 - 54
  • [6] Strain controlled metal-insulator transition in epitaxial NdNiO3 thin films
    Xiang, P. -H.
    Zhong, N.
    Duan, C. -G.
    Tang, X. D.
    Hu, Z. G.
    Yang, P. X.
    Zhu, Z. Q.
    Chu, J. H.
    JOURNAL OF APPLIED PHYSICS, 2013, 114 (24)
  • [7] Microstructure and metal-insulator transition of NdNiO3 thin films on various substrates
    Laffez, P
    Zaghrioui, M
    Monot, I
    Brousse, T
    Lacorre, P
    THIN SOLID FILMS, 1999, 354 (1-2) : 50 - 54
  • [8] Investigation of the metal-insulator transition in NdNiO3 films by site-selective X-ray absorption spectroscopy
    Palina, Natalia
    Wang, Le
    Dash, Sibashisa
    Yu, Xiaojiang
    Breese, Mark B. H.
    Wang, Junling
    Rusydi, Andrivo
    NANOSCALE, 2017, 9 (18) : 6094 - 6102
  • [9] Charge disproportionation observed by resonant X-ray scattering at the metal-insulator transition in NdNiO3
    Scagnoli, V
    Staub, U
    Janousch, M
    Meijer, GI
    Paolasini, L
    D'Acapito, F
    Bednorz, JG
    Allenspach, R
    JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, 2004, 272 : 420 - 421
  • [10] Charge disproportionation observed by resonant X-ray scattering at the metal-insulator transition in NdNiO3
    Staub, U
    Scagnoli, V
    Janousch, M
    Meijer, GI
    Paolasini, L
    D'Acapito, F
    Bednorz, JG
    Allenspach, R
    Lovesey, SW
    PHYSICA B-CONDENSED MATTER, 2004, 345 (1-4) : 23 - 25
12345