Phase-field model for binary alloys

被引:912
|
作者
Kim, SG [1 ]
Kim, WT
Suzuki, T
机构
[1] Kunsan Natl Univ, RASOM, Kunsan 573701, South Korea
[2] Kunsan Natl Univ, Dept Mat Sci & Engn, Kunsan 573701, South Korea
[3] Chongju Univ, Ctr Noncrystalline Mat, Chongju 360764, South Korea
[4] Chongju Univ, Dept Phys, Chongju 360764, South Korea
[5] Univ Tokyo, Dept Mat Engn, Tokyo 113, Japan
来源
PHYSICAL REVIEW E | 1999年 / 60卷 / 06期
关键词
D O I
10.1103/PhysRevE.60.7186
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
We present a phase-field model (PFM) for solidification in binary alloys, which is found from the phase-field model for a pure material by direct comparison of the variables for a pure material solidification and alloy solidification. The model appears to be equivalent with the Wheeler-Boettinger-McFadden (WBM) model [A.A. Wheeler, W. J. Boettinger, and G. B. McFadden, Phys. Rev. A 45, 7424 (1992)], but has a different definition of the free energy density for interfacial region. An extra potential originated from the free energy density definition in the WBM model disappears in this model. At a dilute solution limit, the model is reduced to the Tiaden et al. model [Physica D 115, 73 (1998)] for a binary alloy. A relationship between the phase-field mobility and the interface kinetics coefficient is derived at a thin-interface limit condition under an assumption of negligible diffusivity in the solid phase. For a dilute alloy, a steady-state solution of the concentration profile across the diffuse interface is obtained as a function of the interface velocity and the resultant partition coefficient is compared with the previous solute trapping model. For one dimensional steady-state solidification, where the classical sharp-interface model is exactly soluble, we perform numerical simulations of the phase-field model: Ar low interface velocity, the simulated results from the thin-interface PFM are in excellent agreement with the exact solutions. As the partition coefficient becomes close to unit at high interface velocities, whereas, the sharp-interface PFM yields the correct answer. [S1063-651X(99)08712-7].
引用
收藏
页码:7186 / 7197
页数:12
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