An atomic simulation of AFM-based nano lithography process for nano patterning

The atomic force microscopy (AFM)-based nano lithographic technique is currently used to directly machine material surfaces and fabricate nano patterning for MEMS devices. In this study, three-dimensional molecular dynamic (MD) simulations were conducted to evaluate the effect of crystallographic factors on the forming characteristics of the nano lithography process of monocrystalline copper. The simulation results revealed that the crystal orientation and ploughing direction had a significant influence on the ploughing force as well as the nature of the nano deformation and surface quality of the machined material.