Growth, structure and thermal reduction of MOCVD-deposited Fe films on Al2O3(0001) substrates

被引：5
|
作者：
Liu, KW
Shen, DZ
Zhang, JY [1 ]
Li, BS
Wu, XJ
Feng, QJ
Lu, YM
Fan, XW
机构：
[1] Chinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, Key Lab Excited State Proc, Changchun, Peoples R China
[2] Chinese Acad Sci, Grad Sch, Beijing 100049, Peoples R China
来源：
JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS | 2006年 / 303卷 / 01期
基金：
中国国家自然科学基金;
关键词：
low-pressure metal-organic chemical vapor deposition; magnetic properties; thermal reduction;
D O I：
10.1016/j.jmmm.2005.10.247
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Fe films with strong preferred orientation were prepared on Al2O3 (0 0 0 1) substrates by a new two-step method using low-pressure metal-organic chemical vapor deposition (LP-MOCVD) method. X-ray diffraction (XRD) and a vibrating sample magnetometer were employed to characterize the structure and magnetic properties of the Fe films before and after thermal reduction, which was performed in hydrogen flow at 723-1023 K. XRD patterns indicate that the films changed into alpha-Fe (bcc) mono-phase from a mixture of alpha-Fe2O3 and/or Fe (bcc). (C) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码：79 / 83
页数：5
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