A Novel Microfabrication Technology of Planar Microstrip Slow-Wave Structures for Millimeter-Band Traveling-Wave Tubes

被引：0

作者：

Starodubov, Andrey V. ^{[1
,2
]}

Serdobintsev, Alexey A. ^{[1
]}

Pavlov, Anton M. ^{[1
]}

Galushka, Victor V. ^{[1
]}

Mitin, Dmitry M. ^{[1
]}

Ryskin, Nikita M. ^{[1
,2
]}

机构：

[1] Saratov NG Chernyshevskii State Univ, 83 Astrakhanskaya St, Saratov 410012, Russia

[2] VA Kotelnikov Inst Radio Engn & Elect RAS, Saratov Branch, Micro & Nanoelect Lab, 38 Zelyonaya St, Saratov 410019, Russia

来源：

2018 IEEE INTERNATIONAL VACUUM ELECTRONICS CONFERENCE (IVEC) | 2018年

基金：

俄罗斯科学基金会;

关键词：

slow wave structure; meander line; dielectric substrate; traveling wave tube; laser ablation; magnetron sputtering; microfabrication;

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A novel technology for microfabrication of millimeter-band planar microstrip slow-wave structures (SWS) is proposed. The technology is based on magnetron sputtering and laser ablation methods. The magnetron sputtering method is used to deposit a thin layer of metal (copper) on a quartz substrate. Then laser ablation is utilized to cut a slow wave structure from the copper layer. V-band (50-70 GHz) meander-line SWSs were fabricated and characterized by scanning electron and optical microscopy. The proposed technology has significant advantages in cost, speed and flexibility over lithography processes commonly utilized for such applications.

引用

页码：333 / +

页数：2

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