Fully automated interference lithography

Interferometric Lithography has long been considered a viable means to achieve sub-micron resolution lithography over large areas without the use of traditional photomasks. However, traditional IL configurations set up in laboratories on optical isolation tables requires sophisticated optical designs and are greatly limited in both throughput and yield due to these complexities and manual configurations. The Microphotonics Group at OSC has introduced a series of fully automated interference lithography based tool systems that can achieve resolution down to 190nm period and address a multitude of applications requiring sub-micron resolution in a high-throughput, stabile, manufacturing environment.