Delamination behavior of film-substrate systems under cyclic loading

被引:7
|
作者
Liao, K [1 ]
Wan, KT
机构
[1] Nanyang Technol Univ, Sch Appl Sci, Singapore 639798, Singapore
[2] Nanyang Technol Univ, Sch Mech & Prod Engn, Singapore 639798, Singapore
关键词
D O I
10.1023/A:1006755916044
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The application of shaft-loaded blister method to study the durability of the film-substrate interface under repeated mechanical loadings was examined. Both quasi-static and cyclic tests were carried out in an Instron Tester using a 50 N load cell. To characterize the propagation of delamination under cyclic loading, a range of displacement levels were chosen around which delamination had initiated under monotonic quasi-static loading. Results confirmed that the shaft-loaded blister test is an effective and efficient method to evaluate the durability of the film-substrate interface.
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页码:57 / 59
页数:3
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