A simple and continuous polycrystalline silicon thin-film transistor model for SPICE implementation

被引:12
|
作者
Pappas, I. [1 ]
Hatzopoulos, A. T.
Tassis, D. H.
Arpatzanis, N.
Siskos, S.
Dimitriadis, C. A.
Kamarinos, G.
机构
[1] Univ Thessaloniki, Dept Phys, Thessaloniki 54124, Greece
[2] ENSERG, IMEP, F-38016 Grenoble 1, France
关键词
ELECTRICAL CHARACTERISTICS; TFT;
D O I
10.1063/1.2226979
中图分类号
O59 [应用物理学];
学科分类号
摘要
A simple current-voltage model for polycrystalline silicon thin-film transistors (polysilicon TFTs) is proposed, including the sixth-order polynomial function coefficients fitted to the effective mobility versus gate voltage data, the channel length modulation, and impact ionization effects. The model possesses continuity of current in the transfer characteristics from weak to strong inversion and in the output characteristics throughout the linear and saturation regions of operation. The model parameters are used as input parameters in AIM-SPICE circuit simulator for device modeling. The model has been applied in a number of long and short channel TFTs, and the statistical distributions of the model parameters have been derived which are useful for checking the functionality of TFTs circuits with AIM-SPICE. (c) 2006 American Institute of Physics.
引用
收藏
页数:6
相关论文
共 50 条
  • [21] Thermal oxide of polycrystalline silicon on steel foil as a thin-film transistor gate dielectric
    Wu, M
    Wagner, S
    APPLIED PHYSICS LETTERS, 2001, 78 (23) : 3729 - 3731
  • [22] An Analytical Expression for the Transfer Characteristics of a Polycrystalline Silicon Thin-Film Transistor With an Undoped Channel
    Chow, Thomas
    Wong, Man
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2009, 56 (07) : 1493 - 1498
  • [23] Polycrystalline silicon thin-film transistor technology for flexible large-area electronics
    Tung, YJ
    Carey, PG
    Smith, PM
    Theiss, SD
    Wickboldt, P
    Meng, XF
    Weiss, RE
    Davis, GA
    Aebi, VW
    King, TJ
    FLAT PANEL DISPLAY TECHNOLOGY AND DISPLAY METROLOGY II, 2001, 4295 : 102 - 107
  • [24] Dependence of polycrystalline silicon thin-film transistor characteristics on the grain-boundary location
    Kimura, M
    Inoue, S
    Shimoda, T
    Eguchi, T
    JOURNAL OF APPLIED PHYSICS, 2001, 89 (01) : 596 - 600
  • [25] FLUORINE-ENHANCED OXIDATION OF POLYCRYSTALLINE SILICON AND APPLICATION TO THIN-FILM TRANSISTOR FABRICATION
    KOUVATSOS, DN
    HATALIS, MK
    JACCODINE, RJ
    APPLIED PHYSICS LETTERS, 1992, 61 (08) : 937 - 939
  • [26] Polycrystalline silicon thin-film transistor utilizing self-assembled monolayer for crystallization
    Tojo, Yosuke
    Miura, Atsushi
    Ishikawa, Yasuaki
    Yamashita, Ichiro
    Uraoka, Yukiharu
    THIN SOLID FILMS, 2013, 540 : 266 - 270
  • [27] Polycrystalline Silicon Thin-Film Transistor Using Xe Flash-Lamp Annealing
    Saxena, Saurabh
    Kim, Dong Cheol
    Park, Jeang Hun
    Jang, Jin
    IEEE ELECTRON DEVICE LETTERS, 2010, 31 (11) : 1242 - 1244
  • [28] Surface potential based poly-si thin-film transistor model for SPICE
    Ikeda, Hiroyuki
    2006 INTERNATIONAL ELECTRON DEVICES MEETING, VOLS 1 AND 2, 2006, : 866 - 869
  • [29] A quasi two-dimensional conduction model for polycrystalline silicon thin-film transistor based on discrete grains
    Wong, Man
    Chow, Thomas
    Wong, Chun Cheong
    Zhang, Dougli
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2008, 55 (08) : 2148 - 2156
  • [30] Improved thin-film transistor (TFT) characteristics on chemical-mechanically polished polycrystalline silicon film
    Chan, ACK
    Chan, MS
    Ko, PK
    1999 IEEE HONG KONG ELECTRON DEVICES MEETING, PROCEEDINGS, 1999, : 38 - 41