213 nm laser written waveguides in Ge-doped planar silica without hydrogen loading

被引：4

作者：

Gow, Paul C. ^{[1
]}

Ahmed, Q. Salman ^{[1
]}

Mennea, Paolo L. ^{[1
]}

Bannerman, Rex H. S. ^{[1
]}

Jantzen, Alexander ^{[1
]}

Holmes, Christopher ^{[1
]}

Gates, James C. ^{[1
]}

Gawith, Corin B. E. ^{[1
]}

Smith, Peter G. R. ^{[1
]}

机构：

[1] Univ Southampton, Optoelect Res Ctr, Southampton SO17 1BJ, Hants, England

来源：

OPTICS EXPRESS | 2020年 / 28卷 / 21期

基金：

英国工程与自然科学研究理事会;

关键词：

FEMTOSECOND LASER; PHOTOSENSITIVITY; FIBER; NANOSECOND; LIGHT;

D O I：

10.1364/OE.402762

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

In this paper we present the first example of waveguides fabricated by UV writing in non-hydrogen loaded Ge-doped planar silica with 213 nm light. Single mode waveguides were fabricated and the numerical apertures and mode field diameters were measured for a range of writing fluences. A peak index change of 5.3 x 10(-3) was inferred for the waveguide written with 70 kJ cm(-2). The refractive index change is sufficient to match the index structure of standard optical fiber. Uniformity of the written structures was measured and a propagation loss of 0.39 +/- 0.03 dB cm(-1) was determined through cutback measurements. Published by The Optical Society under the terms of the Creative Commons Attribution 4.0 License.

引用

页码：32165 / 32172

页数：8

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