Fabrication of Uniform Gratings on Composite Semiconductors Using UV Nanoimprint Lithography

被引：5

作者：

Ishizuka, Shugo ^{[1
]}

Nakao, Masashi ^{[2
,4
]}

Mashiko, Shinro ^{[2
,4
]}

Mizuno, Jun ^{[3
]}

Shoji, Shuichi ^{[1
]}

机构：

[1] Waseda Univ, Shinjyuku Ku, 3-4-1 Okubo, Tokyo 1698555, Japan

[2] Natl Inst Informat & Commun Technol, Future ICT Res Ctr, Nishi Ku, Kobe, Hyogo 6512492, Japan

[3] Waseda Univ, Nanotechnol Res Lab, Shinjyuku Ku, Tokyo 1620041, Japan

[4] Japan Sci & Technol Agcy, CREST, Tokyo, Japan

来源：

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY | 2009年 / 22卷 / 02期

关键词：

UV nanoimprint lithography; gratings; composite semiconductors; uniformity;

D O I：

10.2494/photopolymer.22.213

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

A fabrication method of uniform gratings on composite semiconductors using ultraviolet nanoimprint lithography (UV-NIL) is described. Since the grating pattern was batch transferred to the resin on substrates in this process, a high throughput fabrication process is expected. Both the dry etching process and the wet etching process can be performed for composite semiconductors patterning. The uniformity of the pattern height on a 3 inch GaAs substrate is better than the standard deviation of 2.6.

引用

页码：213 / 217

页数：5

共 50 条

[21] Nanoimprint lithography fabrication of waveguide-integrated optical gratings with inexpensive stamps
Grego, Sonia
Huffman, Alan
Lueck, Matthew
Stoner, Brian R.
Lannon, John
MICROELECTRONIC ENGINEERING, 2010, 87 (10) : 1846 - 1851
[22] Fabrication process for micropatterned ceramics via UV-nanoimprint lithography using UV-curable binder
Okabe, Takao
Kim, Yongtae
Jiao, Zhenjun
Shikazono, Naoki
Taniguchi, Jun
JAPANESE JOURNAL OF APPLIED PHYSICS, 2018, 57 (10)
[23] Soft Stamp UV-Nanoimprint Lithography for Fabrication of Laser Diodes
Viheriala, Jukka
Viljanen, Milla-Riina
Kontio, Juha
Leinonen, Tomi
Tommila, Juha
Dumitrescu, Mihail
Niemi, Tapio
Pessa, Markus
ALTERNATIVE LITHOGRAPHIC TECHNOLOGIES, 2009, 7271
[24] Reverse-contact UV nanoimprint lithography for multilayered structure fabrication
Kehagias, N.
Reboud, V.
Chansin, G.
Zelsmann, M.
Jeppesen, C.
Schuster, C.
Kubenz, M.
Reuther, F.
Gruetzner, G.
Torres, C. M. Sotomayor
NANOTECHNOLOGY, 2007, 18 (17)
[25] UV-Nanoimprint Lithography: Structure, Materials and Fabrication of Flexible Molds
Lan, Hongbo
Liu, Hongzhong
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, 2013, 13 (05) : 3145 - 3172
[26] Fabrication of TiO2 nano-to-microscale structures using UV nanoimprint lithography
Choi, Je-Hong
Jo, Han-Byeol
Choi, Hak-Jong
Lee, Heon
NANOTECHNOLOGY, 2013, 24 (19)
[27] Curvature-Adjustable Polymeric Nanolens Fabrication Using UV-Controlled Nanoimprint Lithography
Li, Qiang
Ji, Myung Gi
Chapagain, Ashish
Cho, In Ho
Kim, Jaeyoun
MICROMACHINES, 2022, 13 (12)
[28] UV nanoimprint lithography using an elementwise embossed stamp
Jeong, JH
Sim, YS
Sohn, H
Lee, ES
2004 INTERNATIONAL CONFERENCE ON MEMS, NANO AND SMART SYSTEMS, PROCEEDINGS, 2004, : 233 - 236
[29] Nanoimprint lithography for nanodevice fabrication
Steven Barcelo
Zhiyong Li
Nano Convergence, 3
[30] Nanoimprint lithography for nanodevice fabrication
Barcelo, Steven
Li, Zhiyong
NANO CONVERGENCE, 2016, 3

← 1 2 3 4 5 →