Structural investigation of nanoporous alumina film with grazing incidence small angle X-ray scattering

被引：1

作者：

Buttard, D. ^{[1
,2
]}

Schuelli, T. ^{[3
]}

Lazzari, R. ^{[4
]}

机构：

[1] CEA Gre, INAC, SiNaPS MINATEC, F-38054 Grenoble, France

[2] Univ Grenoble 1, IUT 1, F-38000 Grenoble, France

[3] European Synchrotron Radiat Facil, F-38000 Grenoble, France

[4] Univ Paris 06, CNRS UMR 7588, Inst NanoSci Paris, F-75252 Paris 05, France

来源：

PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE | 2013年 / 210卷 / 11期

关键词：

GISAXS; nanoporous alumina; structure; SILICON NANOWIRES; PATTERN; GROWTH; ARRAYS;

D O I：

10.1002/pssa.201330024

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Nanoporous alumina films (NPAF) have been elaborated by anodization of an aluminum film on silicon wafer. Ex situ structural characterization of the films has been achieved with grazing incidence small angle X-ray scattering under ultra high vacuum atmosphere and using a synchrotron source. The comparison of the experimental patterns with suitable modeling confirms the cylindrical geometry of the pores well as the good local hexagonal order. (C) 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim

引用

页码：2521 / 2525

页数：5

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