Vacuum arc deposition of Mo films

Mo coatings on Cu substrates were deposited with the aid of an unfiltered vacuum are at a deposition voltage of 31 V. Dependencies of the deposition rate R(d) on the discharge current I (in the interval from 80 to 180 A) and the distance L between the cathode and substrate were investigated. R(d) increases monotonically with increasing I and decreases with increasing L. If the substrate is parallel to the cathode surface, R(d) is much higher than it is for substrates which are perpendicular to the cathode surface. R(d) values as high as 15 nm/s were reached. The reasons for this behavior are analyzed. It is also shown that Mo macroparticles are well incorporated into the coating building an integral part of it. (C) 1996 American Vacuum Socity.