Parametric Studies of Thin Film Nickel Catalyst for the Growth of Carbon Nanotubes

被引:0
|
作者
Saidin, M. A. R. [1 ,2 ]
Aziz, M. [2 ]
Ismail, A. F. [1 ]
机构
[1] Univ Teknol Malaysia, Fac Chem & Nat Resources Engn, Dept Gas, Adv Membrane Technol Res Ctr, Johor Baharu 81310, Malaysia
[2] Univ Teknol Malaysia, Fac Sci, Dept Chem, Skudai 81310, Malaysia
来源
NANOSCIENCE AND NANOTECHNOLOGY | 2009年 / 1136卷
关键词
Carbon Nanotubes (CNTs); Catalyst; Nickel; Plasma bombardment;
D O I
暂无
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The thickness and morphology of the catalyst film significantly affect the properties of carbon nanotubes (CNTs). The catalyst size and shape are the key factors for the controlling of CNT diameter. Therefore, the objectives of this study are to develop a thin catalyst film for CNTs growth application by varying the time of deposition and investigate the effect of radio frequency (rf) plasma power. The thin catalyst film was developed using physical sputtering method with an rf power between 20 to 100 watt at varying deposition time with nickel as a catalyst. The Ni/Cr film in this study was fabricated on corning glass substrates. The thin film nickel catalyst was obtained with a thickness of 12 nm using surface profiler and was characterized using field emission scanning electron microscopy (FESEM) and atomic force microscopy (AFM) to determine the morphologies and particle size of the catalyst. It was observed that structural morphology of thin Ni film is influenced by rf power and deposition time.
引用
收藏
页码:219 / +
页数:2
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