Submicron, high speed complementary metal-oxide semiconductor compatible metal-semiconductor-metal photodetector

被引:1
|
作者
DeVries, AM
Tarr, NG
Cheben, P
Grant, PD
Janz, S
Xu, DX
机构
[1] Carleton Univ, Dept Elect, Ottawa, ON K1S 5B6, Canada
[2] Natl Res Council Canada, Inst Microstruct Sci, Ottawa, ON K1S 5B6, Canada
关键词
D O I
10.1116/1.1475981
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Metal-semiconductor-metal photodetectors with electrode spacing of 0.5 mum have been fabricated on polysilicon films formed by low-pressure chemical vapor deposition. The detectors give a responsivity of 8 mA/W at 980 nm, and a 3-dB bandwidth of 1.5 GHz. Steady-state and transient photoresponse both appear to be limited by recombination and trapping at energy levels within the forbidden gap. (C) 2002 American Vacuum Society.
引用
收藏
页码:1079 / 1081
页数:3
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