Nanopatterning of periodically strained surfaces - A kinetic Monte Carlo simulation study

被引：0
|
作者：
Larsson, MI [1 ]
Sabiryanov, RF [1 ]
Cho, K [1 ]
Clemens, BM [1 ]
机构：
[1] Stanford Univ, Dept Mat Sci & Engn, Stanford, CA 94305 USA
来源：
NANOTECH 2003, VOL 3 | 2003年
关键词：
D O I：
暂无
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
Various aspects of strain-assisted nanopatterning of periodically strained surfaces are investigated using kinetic Monte Carlo simulations. The optimal growth conditions for various material systems can be predicted, as we demonstrate for the model system Co on Pt(I 11). Both strain relaxation and modified potential energy barriers at step edges, i.e. the Ehrlich-Schwoebel (ES) barriers are found to be of large importance for the nanopatterning.
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收藏
页码：239 / 242
页数：4
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