Global model and diagnostic of a low-pressure SF6/Ar inductively coupled plasma

被引:53
|
作者
Lallement, L. [1 ]
Rhallabi, A. [1 ]
Cardinaud, C. [1 ]
Peignon-Fernandez, M. C. [1 ]
Alves, L. L. [2 ]
机构
[1] Univ Nantes, CNRS, Inst Mat, F-44322 Nantes, France
[2] Inst Super Tecn, Inst Plasmas & Fusao Nucl, P-1049001 Lisbon, Portugal
来源
PLASMA SOURCES SCIENCE & TECHNOLOGY | 2009年 / 18卷 / 02期
关键词
HIGH-DENSITY PLASMAS; LANGMUIR PROBE MEASUREMENTS; ELECTRON-IMPACT IONIZATION; RF DISCHARGE; GLOW-DISCHARGES; ETCHING PROCESS; CROSS-SECTIONS; ASPECT-RATIO; SILICON; GASES;
D O I
10.1088/0963-0252/18/2/025001
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
A global model has been developed for low-pressure (3-20m Torr), radio-frequency (rf) (13.56 MHz) inductively coupled plasmas (ICPs), produced in SF6/Ar mixtures. The model is based on a set of mass balance equations for all the species considered, coupled to the discharge power balance equation and the charge neutrality condition. Simulations are used to show the impact of operating conditions, such as the rf power, the pressure and the percentage of argon in the mixture, on the evolution of charged and neutral species. Langmuir probe and optical emission spectroscopy measurements are used to determine the electron temperature and the densities of electrons, ions and atomic fluorine in the SF6/Ar ICPs under study. These data are compared with simulation results obtained from the global model. A satisfactory agreement is found between the simulation results and the measured values of the electron density and temperature, for rf powers in the range 900-1700W, regardless of the percentage of argon in the mixture. Predictions for the atomic fluorine density (similar to 10(14) cm(-3)) are in good agreement with experiment, for various rf powers.
引用
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页数:10
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