High quality conductive gallium-doped zinc oxide films deposited at room temperature

被引:97
|
作者
Fortunato, E [1 ]
Assunçao, V
Gonçalves, A
Marques, A
Aguas, H
Pereira, L
Ferreira, I
Vilarinho, P
Martins, R
机构
[1] Univ Nova Lisboa, Fac Sci & Technol, Dept Mat Sci CENIMAT, P-2829516 Caparica, Portugal
[2] Univ Nova Lisboa, CEMOP, P-2829516 Caparica, Portugal
[3] Univ Aveiro, CICECO, Dept Ceram & Glass Engn, P-3810193 Aveiro, Portugal
关键词
gallium; zinc oxide; thin film; rf magnetron sputtering; transparent conductive oxide;
D O I
10.1016/j.tsf.2003.10.139
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Transparent and highly conducting gallium-doped zinc oxide films were successfully deposited by if sputtering at room temperature. The lowest resistivity achieved was 2.6 X 10(-4) Omega cm for a thickness of 1100 nm (sheet resistance approximate to 1.6 Omega /sq), with a Hall mobility of 18 cm(2)/Vs and a carrier concentration of 1.3 X 10(21) cm(-3). The films are polycrystalline with a hexagonal structure and a strongly preferred orientation along the c-axis. A linear dependence between the mobility and the crystallite size was obtained. The films present a transmittance in the visible spectra between 80 and 90% and a refractive index of approximately 2. which is very close to the value reported for bulk material. (C) 2003 Elsevier B.V. All rights reserved.
引用
收藏
页码:443 / 447
页数:5
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