Interfacial topography and properties of graphene sheets on different reconstructed silicon surfaces

被引:2
|
作者
Lee, Wen-Jay [1 ,2 ]
Chiang, Kuo-Ning [3 ]
Lebiga, Vadim [4 ]
Fomin, Vasily [4 ]
机构
[1] Natl Ctr High Performance Comp, Taichung 40763, Taiwan
[2] Natl Chung Hsing Univ, Dept Phys, Taichung 40227, Taiwan
[3] Natl Tsing Hua Univ, Adv Packaging Res Ctr, Dept Power Mech Engn, Hsinchu 30013, Taiwan
[4] Khristianovich Inst Theoret & Appl Mech, Novosibirsk 630090, Russia
关键词
Graphene; Silicon; Reconstruction surface; Interface; Molecular dynamics; Heterojunction; Thermal expansion; Atomic structure; STRUCTURAL-PROPERTIES; THERMAL-EXPANSION; POINTS;
D O I
10.1016/j.carbon.2015.09.009
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Graphene growth on a substrate has been widely investigated due to its broad application potential. Previous studies have found that the properties of graphene depend on its underlying substrate and their interaction. However, the dynamic behavior of the interfacial structure as a function of temperature has not been investigated, as well as the interfacial structure related to its mechanical properties. In this work, molecular dynamics has been employed to study the topographic characteristics and intrinsic mechanical properties of graphene when attached to a reconstructed silicon surface. The fitness between the interfacial structures plays an important role in stabilizing the attached graphene and forming pattern. The degree of planarity of the attached graphene determines the magnitude of the residual stress, while temperature affects atomic bonding and varies this residual stress. Findings suggest that the different pairings between graphene and surface structures significantly affects the topographic characteristics, residual stress, and interaction strength of the graphene sheet, which would further change the electronic properties of its application. (C) 2015 Published by Elsevier Ltd.
引用
收藏
页码:29 / 39
页数:11
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