Oxygen Vacancies Control Transition of Resistive Switching Mode in Single-Crystal TiO2 Memory Device

被引:90
|
作者
Ge, Jun [1 ]
Chaker, Mohamed [1 ]
机构
[1] Inst Natl Rech Sci, Ctr Energie Mat Telecommun, 1650 Blvd Lionel Boulet, Varennes, PQ J3X 1S2, Canada
关键词
resistive memory; titanium dioxide; oxygen vacancies; resistive switching mode; single-crystal; THIN-FILM; MEMRISTOR; CONDUCTANCE; MECHANISM; DIFFUSION; TITANIUM;
D O I
10.1021/acsami.7b03527
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Epitaxial TiO2 thin filins were grown by radio frequency magnetron sputtering on conductive Nb-SrTiO3 substrates. X-ray photoelectron specttoscopy reveals that the oxygen vacancies inside the TiO2 films can be dramatically reduced by postannealing treatment under an oxygen atmosphere. The decreasing concentration of oxygen vacancies modifies the resistive switching (RS) mechanism from a valence change mode to a electrochemical metallization mode, resulting in a high switching ratio (>= 10(5)), a small electronic leakage current in the high-resistance (>= 10(9) Omega) state, and a highly controlled quantized conductance (QC) in the low -resistance state. These results between different RS mechanisms as-well as the QC for multilevel data storage application. allow for understanding the relationship between different RS mechanisms as well as the QC for multilevel data storage application.
引用
收藏
页码:16327 / 16334
页数:8
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