X-ray lithography for 3D microfluidic applications

被引：30
|
作者：
Romanato, F
Tormen, M
Businaro, L
Vaccari, L
Stomeo, T
Passaseo, A
Di Fabrizio, E
机构：
[1] Beamline Electra Synchrotron LILIT Source, Lilit Nanolithog, INFM, TASC, I-34012 Trieste, Italy
[2] Univ Lecce, INFM, Natl Nanotechnol Lab, I-73100 Lecce, Italy
来源：
MICROELECTRONIC ENGINEERING | 2004年 / 73-4卷
关键词：
X-ray lithography; microfluidics; three-dimensional lithography; combined lithographies; microchannel;
D O I：
10.1016/j.mee.2004.03.067
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
This work addresses the fabrication by X-ray lithography of building block structures for integrated microfluidics. In particular, we demonstrate the realization of a closed microfluidic channel based on a multiple tilted X-ray exposure scheme without the need for registration steps. This scheme is exploited also for the fabrication of metallic 2D vertical gratings that can be used as sieves or electrical detectors in microfluidic channels.. Finally, we describe a new process based on the combination of X-ray-and e-beam lithography for the realization of flyover channel connecting vertical micro-tank structures. (C) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码：870 / 875
页数：6
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