Different discharge regimes in a microwave cavity coupling system used for the generation of moderate pressure H2 and H2/CH4 plasmas

被引：0
|
作者：
Hassouni, K [1 ]
Grotjohn, TA
Gicquel, A
机构：
[1] CNRS, LIMHP, UPR 1311, F-93430 Villetaneuse, France
[2] Michigan State Univ, Dept Elect Engn, E Lansing, MI 48824 USA
来源：
IEEE TRANSACTIONS ON PLASMA SCIENCE | 2002年 / 30卷 / 01期
关键词：
hydrogen discharges; microwave cavity-coupling system; self-consistent simulation;
D O I：
10.1109/TPS.2002.1003979
中图分类号：
O35 [流体力学]; O53 [等离子体物理学];
学科分类号：
070204 ; 080103 ; 080704 ;
摘要：
Simulated two-dimensional distributions of absorbed power density in a moderate pressure H-2 plasma obtained using a microwave cavity coupling system are presented. In a first set of simulation, we analyze the change in the power density distribution when input power is increased at a constant pressure. Then, we investigate the evolution of this distribution when the average power density is increased by simultaneously increasing the input power and the pressure while keeping the plasma volume constant.
引用
收藏
页码：172 / 173
页数：2
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