Modeling of H2 and H2/CH4 moderate-pressure microwave plasma used for diamond deposition

被引：0
|
作者：
LIMHP, CNRS-UPN, Avenue J. B. Clément, 93430 Villetaneuse, France [1 ]
机构：
来源：
Plasma Chem. Plasma Process. | / 3卷 / 325-362期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [1] Modeling of H2 and H2/CH4 Moderate-Pressure Microwave Plasma Used for Diamond Deposition
    K. Hassouni
    O. Leroy
    S. Farhat
    A. Gicquel
    [J]. Plasma Chemistry and Plasma Processing, 1998, 18 : 325 - 362
  • [2] Modeling of H2 and H2/CH4 moderate-pressure microwave plasma used for diamond deposition
    Hassouni, K
    Leroy, O
    Farhat, S
    Gicquel, A
    [J]. PLASMA CHEMISTRY AND PLASMA PROCESSING, 1998, 18 (03) : 325 - 362
  • [3] Study of an H2/CH4 moderate pressure microwave plasma used for diamond deposition:: modelling and IR tuneable diode laser diagnostic
    Lombardi, G
    Hassouni, K
    Stancu, GD
    Mechold, L
    Röpcke, J
    Gicquel, A
    [J]. PLASMA SOURCES SCIENCE & TECHNOLOGY, 2005, 14 (03): : 440 - 450
  • [4] Spectroscopic diagnostics and modeling of Ar/H2/CH4 microwave discharges used for nanocrystalline diamond deposition
    Lombardi, G
    Hassouni, K
    Bénédic, F
    Mohasseb, F
    Röpcke, J
    Gicquel, A
    [J]. JOURNAL OF APPLIED PHYSICS, 2004, 96 (11) : 6739 - 6751
  • [5] Spectroscopic diagnostics and modeling of Ar/H2/CH4 microwave discharges used for nanocrystalline diamond deposition
    Lombardi, G.
    Hassouni, K.
    Bénédic, F.
    Mohasseb, F.
    Röpcke, J.
    Gicquel, A.
    [J]. Bénédic, F. (benedic@limhp.univ-paris13.fr), 1600, American Institute of Physics Inc. (96):
  • [6] Overview of the different aspects in modelling moderate pressure H2 and H2/CH4 microwave discharges
    Hassouni, K
    Lombardi, G
    Duten, X
    Haagelar, G
    Silva, F
    Gicquel, A
    Grotjohn, TA
    Capitelli, M
    Röpcke, J
    [J]. PLASMA SOURCES SCIENCE & TECHNOLOGY, 2006, 15 (01): : 117 - 125
  • [7] Different discharge regimes in a microwave cavity coupling system used for the generation of moderate pressure H2 and H2/CH4 plasmas
    Hassouni, K
    Grotjohn, TA
    Gicquel, A
    [J]. IEEE TRANSACTIONS ON PLASMA SCIENCE, 2002, 30 (01) : 172 - 173
  • [8] Mass spectrometric studies of a CH4/H2 microwave plasma under diamond deposition conditions
    Fujii, T
    Kareev, M
    [J]. JOURNAL OF APPLIED PHYSICS, 2001, 89 (05) : 2543 - 2546
  • [9] Determining electron temperature and electron density in moderate pressure H2/CH4 microwave plasma
    Derkaoui, N.
    Rond, C.
    Gries, T.
    Henrion, G.
    Gicquel, A.
    [J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2014, 47 (20)
  • [10] Synthesis of nanocrystalline diamond film using CH4/H2 microwave plasma
    Hong, SP
    Yoshikawa, H
    Koga, Y
    [J]. NEW DIAMOND AND FRONTIER CARBON TECHNOLOGY, 2002, 12 (03): : 129 - 132
12345