Aerosol assisted atmospheric pressure plasma jet for a high deposition rate of silica-like thin films

被引：4

作者：

Magnan, Romain ^{[1
]}

Clergereaux, Richard ^{[1
]}

Villeneuve-Faure, Christina ^{[1
]}

Lantin, Benoit ^{[1
]}

Carnide, Guillaume ^{[1
,2
]}

Raynaud, Patrice ^{[1
]}

Naude, Nicolas ^{[1
]}

机构：

[1] Univ Toulouse, INPT, UPS, LAPLACE,CNRS, F-31062 Toulouse, France

[2] Univ Toulouse, CNRS, LCC, F-31062 Toulouse, France

来源：

EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS | 2022年 / 97卷

关键词：

SIOX FILMS; HMDSO;

D O I：

10.1051/epjap/2022210291

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

This paper investigated thin films deposition processes of silica-like based on the injection of liquid droplets in Atmospheric Pressure Plasma Jet-APPJ operated in open air. An aerosol of hexamethyldisilane is produced by a syringe-pump and injected in a nitrogen post-discharge for different liquid precursor and carrier gas flow rates. For high carrier gas flow, this process enables to form silica-like without addition of oxygen in the plasma phase. Furthermore, this process offers a thin film dynamic deposition rate from 500 to 1400 nm.m.min(-1) depending on the carrier gas flow and the film structure departs from silica-like to organosilicon layers for the lowest flow rates. These evolutions are attributed to plasma-droplets interactions related to the transport of droplets, the evaporation of liquid and plasma polymerization.

引用

页数：9

共 50 条

[11] On the formation mechanisms of the diffuse atmospheric pressure dielectric barrier discharge in CVD processes of thin silica-like films
Starostin, S. A.
Premkumar, P. Antony
Creatore, M.
van Veldhuizen, E. M.
de Vries, H.
Paffen, R. M. J.
van de Sanden, M. C. M.
PLASMA SOURCES SCIENCE & TECHNOLOGY, 2009, 18 (04):
[12] Deposition of Hydroxyl Functionalized Films by Means of ethylene Aerosol-Assisted Atmospheric Pressure Plasma
Yang, Yi-Wei
Camporeale, Giuseppe
Sardella, Eloisa
Dilecce, Giorgio
Wu, Jong-Shinn
Palumbo, Fabio
Favia, Pietro
PLASMA PROCESSES AND POLYMERS, 2014, 11 (11) : 1102 - 1111
[13] Deposition of diamond films in arc plasma jet at atmospheric pressure
Gregor, I
Jakubova, I
Senk, J
Hrabovsky, M
Kolman, B
Konrád, M
Kopecky, V
Vorlícek, V
Pokorny, J
CZECHOSLOVAK JOURNAL OF PHYSICS, 2002, 52 : 878 - 885
[14] Aerosol-Assisted plasma deposition of nanocomposite thin films
Simonnet, C.
Parmar, D.
Pozsgay, V.
Feron, M.
Carnide, G.
Kahn, M. L.
Stafford, L.
Clergereaux, R.
2022 IEEE 22ND INTERNATIONAL CONFERENCE ON NANOTECHNOLOGY (NANO), 2022, : 413 - 416
[15] Atmospheric-pressure silica-like thin film deposition using 200 kHz/13.56 MHz dual frequency excitation
Liu, Y.
Elam, F. M.
Zoethout, E.
Starostin, S. A.
van de Sanden, M. C. M.
de Vries, H. W.
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2019, 52 (35)
[16] Deposition of transparent and conductive ZnO films by an atmospheric pressure plasma-jet-assisted process
Hsu, C. M.
Lien, S. T.
Yang, Y. J.
Chen, J. Z.
Cheng, I. C.
Hsu, C. C.
THIN SOLID FILMS, 2014, 570 : 423 - 428
[17] Investigation of atmospheric pressure plasma-jet system used for deposition of ZnO thin films
Chichina, M
Churpita, O
Hubicka, Z
Ticky, M
Holdová, M
Virostko, P
ACTA PHYSICA SLOVACA, 2005, 55 (05) : 429 - 434
[18] Particle formation during deposition of SiOx nanostructured thin films by atmospheric pressure plasma jet
Ussenov, Y. A.
Hansen, L.
Kruger, T.
Ramazanov, T. S.
Kersten, H.
JAPANESE JOURNAL OF APPLIED PHYSICS, 2020, 59 (SH)
[19] Atmospheric-pressure plasma-enhanced chemical vapor deposition of electrochromic organonickel oxide thin films with an atmospheric pressure plasma jet
Lin, Yung-Sen
Lin, Di-Jiun
Sung, Ping-Ju
Tien, Shih-Wei
THIN SOLID FILMS, 2013, 532 : 36 - 43
[20] Synthesis of nanostructure diamond-like carbon thin films by atmospheric pressure plasma jet
Humud, Hammad R.
Kadhem, Saba J.
Abbass, A. A.
8TH INTERNATIONAL CONFERENCE ON APPLIED SCIENCE AND TECHNOLOGY (ICAST 2020), 2020, 2290

← 1 2 3 4 5 →