Aerosol assisted atmospheric pressure plasma jet for a high deposition rate of silica-like thin films

被引：4

作者：

Magnan, Romain ^{[1
]}

Clergereaux, Richard ^{[1
]}

Villeneuve-Faure, Christina ^{[1
]}

Lantin, Benoit ^{[1
]}

Carnide, Guillaume ^{[1
,2
]}

Raynaud, Patrice ^{[1
]}

Naude, Nicolas ^{[1
]}

机构：

[1] Univ Toulouse, INPT, UPS, LAPLACE,CNRS, F-31062 Toulouse, France

[2] Univ Toulouse, CNRS, LCC, F-31062 Toulouse, France

来源：

EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS | 2022年 / 97卷

关键词：

SIOX FILMS; HMDSO;

D O I：

10.1051/epjap/2022210291

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

This paper investigated thin films deposition processes of silica-like based on the injection of liquid droplets in Atmospheric Pressure Plasma Jet-APPJ operated in open air. An aerosol of hexamethyldisilane is produced by a syringe-pump and injected in a nitrogen post-discharge for different liquid precursor and carrier gas flow rates. For high carrier gas flow, this process enables to form silica-like without addition of oxygen in the plasma phase. Furthermore, this process offers a thin film dynamic deposition rate from 500 to 1400 nm.m.min(-1) depending on the carrier gas flow and the film structure departs from silica-like to organosilicon layers for the lowest flow rates. These evolutions are attributed to plasma-droplets interactions related to the transport of droplets, the evaporation of liquid and plasma polymerization.

引用

页数：9

共 50 条

[1] High current diffuse dielectric barrier discharge in atmospheric pressure air for the deposition of thin silica-like films
Starostin, S. A.
Premkumar, P. Antony
Creatore, M.
de Vries, H.
Paffen, R. M. J.
van de Sanden, M. C. M.
APPLIED PHYSICS LETTERS, 2010, 96 (06)
[2] Atmospheric Pressure Barrier Discharge Deposition of Silica-Like Films on Polymeric Substrates
Starostine, Sergei
Aldea, Eugen
de Vries, Hindrik
Creatore, Mariadriana
van de Sanden, M. C. M.
PLASMA PROCESSES AND POLYMERS, 2007, 4 : S440 - S444
[3] Conformity of Silica-like Thin Films Deposited by Atmospheric Pressure Townsend Discharge and Transport Mechanisms
de Larclause, Isabelle Savin
Paulmier, Thierry
Enache, Ionut
Caquineau, Hubert
Raynaud, Patrice
Massines, Francoise
Gherardi, Nicolas
IEEE TRANSACTIONS ON PLASMA SCIENCE, 2009, 37 (06) : 970 - 978
[4] Deposition of zinc oxide thin films by an atmospheric pressure plasma jet
Hsu, Yao-wen
Li, Hsin-Chieh
Yang, Yao-Jhen
Hsu, Cheng-che
THIN SOLID FILMS, 2011, 519 (10) : 3095 - 3099
[5] Deposition Kinetics of Thin Silica-Like Coatings in a Large Plasma Reactor
Gosar, Ziga
Donlagic, Denis
Pevec, Simon
Kovac, Janez
Mozetic, Miran
Primc, Gregor
Vesel, Alenka
Zaplotnik, Rok
MATERIALS, 2019, 12 (19)
[6] Atmospheric pressure roll-to-roll plasma enhanced CVD of high quality silica-like bilayer encapsulation films
Elam, Fiona M.
Starostin, Sergey A.
Meshkova, Anna S.
van der Velden-Schuermans, Bernadette C. A. M.
Bouwstra, Jan B.
van de Sanden, Mauritius C. M.
de Vries, Hindrik W.
PLASMA PROCESSES AND POLYMERS, 2017, 14 (07)
[7] Deposition of ZnO Thin Films by an Atmospheric Pressure Plasma Jet-Assisted Process: The Selection of Precursors
Hsu, Chun-Ming
Li, Hsin-Chieh
Lien, Shao-Tzu
Chen, Jian-Zhang
Cheng, I-Chun
Hsu, Cheng-Che
IEEE TRANSACTIONS ON PLASMA SCIENCE, 2015, 43 (02) : 670 - 674
[8] Deposition of thin films using argon/acetylene atmospheric pressure plasma jet
Ricci Castro, Alonso H.
Kodaira, Felipe V. P.
Prysiazhnyi, Vadym
Mota, Rogerio P.
Kostov, Konstantin G.
SURFACE & COATINGS TECHNOLOGY, 2017, 312 : 13 - 18
[9] Deposition of thin films on glass fiber fabrics by atmospheric pressure plasma jet
Gao, Ming
Wang, Yu
Zhang, Yongliang
Li, Ying
Tang, Yao
Huang, Yifan
SURFACE & COATINGS TECHNOLOGY, 2020, 404
[10] DEPOSITION OF THIN ZINC FILMS BY ATMOSPHERIC PRESSURE PLASMA JET IN AQUEOUS MEDIA
Galmiz, O.
Brablec, A.
Kudrle, V.
HAKONE XV: INTERNATIONAL SYMPOSIUM ON HIGH PRESSURE LOW TEMPERATURE PLASMA CHEMISTRY: WITH JOINT COST TD1208 WORKSHOP: NON-EQUILIBRIUM PLASMAS WITH LIQUIDS FOR WATER AND SURFACE TREATMENT, 2016, : 279 - 282

← 1 2 3 4 5 →