Towards sub-micrometer high aspect ratio X-ray gratings by atomic layer deposition of iridium

被引：37

作者：

Vila-Comamala, Joan ^{[1
,2
,3
]}

Romano, Lucia ^{[1
,2
,3
,4
,5
]}

Guzenko, Vitaliy ^{[1
,2
]}

Kagias, Matias ^{[1
,2
,3
]}

Stampanoni, Marco ^{[1
,2
,3
]}

Jefimovs, Konstantins ^{[1
,2
,3
]}

机构：

[1] Univ Zurich, Inst Biomed Engn, CH-8092 Zurich, Switzerland

[2] Swiss Fed Inst Technol, CH-8092 Zurich, Switzerland

[3] Paul Scherrer Inst, CH-5232 Villigen, Switzerland

[4] Univ Catania, Dept Phys, I-95023 Catania, Italy

[5] Univ Catania, CNR IMM, I-95023 Catania, Italy

来源：

MICROELECTRONIC ENGINEERING | 2018年 / 192卷

基金：

瑞士国家科学基金会;

关键词：

Grating-based X-ray interferometry; Deep reactive ion etching of silicon; Atomic layer deposition of iridium; INTERFEROMETER; FABRICATION; COVERAGE;

D O I：

10.1016/j.mee.2018.01.027

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

X-ray grating interferometry is an excellent technique for X-ray phase contrast imaging and X-ray wavefront sensing with applications in materials science, biology and medical diagnosis. Among other requirements, the method depends on the availability of highly X-ray absorbing metallic gratings. Here, we report on the fabrication and characterization of high aspect ratio iridium gratings with a period of 1 mu m and a depth of 30 mu m combining deep reactive ion etching of silicon and atomic layer deposition of iridium. The implementation of such structures can greatly enhance the sensitivity of grating-based X-ray phase contrast imaging and thus, expand further its broad range of applications. (C) 2018 Elsevier B.V. All rights reserved.

引用

页码：19 / 24

页数：6

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