Chemical deposition of cubic CdSe and HgSe thin films and their characterization

被引:68
|
作者
Hankare, PP [1 ]
Bhuse, VM
Garadkar, KM
Delekar, SD
Mulla, IS
机构
[1] Shivaji Univ, Dept Chem, Thin Film Res Lab, Kolhapur 416004, Maharashtra, India
[2] Govt Rajaram Coll, Dept Chem, Kolhapur, Maharashtra, India
[3] Natl Chem Lab, Pune, Maharashtra, India
关键词
D O I
10.1088/0268-1242/19/1/012
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A modified chemical bath deposition method has been developed to prepare CdSe and HgSe semiconductor thin films in cubic modification, based on the chemical reaction of complexed cadmium acetate, mercuric nitrate with sodium selenosulphate in an aqueous ammoniacal medium at 5 degreesC. The films were characterized by using x-ray diffraction, optical absorption, electrical measurements and energy dispersive x-ray analysis techniques. The films were uniform, well adherent, dark red and polycrystalline in cubic form without trace of any hexagonality. The CdSe film shows two bandgaps at 2.15 and 1.86 eV, while HgSe shows two bandgaps at 0.8 and 0.45 eV. A thermoelectric study indicated the presence of an n-type conduction mechanism.
引用
收藏
页码:70 / 75
页数:6
相关论文
共 50 条
  • [41] Chemical bath deposition of indium sulphide thin films: preparation and characterization
    Lokhande, C.D.
    Ennaoui, A.
    Patil, P.S.
    Giersig, M.
    Diesner, K.
    Muller, M.
    Tributsch, H.
    Thin Solid Films, 340 (01): : 18 - 23
  • [42] Characterization of lead oxide thin films produced by chemical vapor deposition
    McMaster Univ, Hamilton, Canada
    J Am Ceram Soc, 4 (988-996):
  • [43] Preparation and characterization, of crystalline MnS thin films by chemical bath deposition
    Gümüs, C
    Ulutas, C
    Esen, R
    Özkendir, OM
    Ufuktepe, Y
    THIN SOLID FILMS, 2005, 492 (1-2) : 1 - 5
  • [44] Chemical vapor deposition and characterization of amorphous teflon fluoropolymer thin films
    Sharangpani, R
    Singh, R
    Drews, M
    Ivey, K
    JOURNAL OF ELECTRONIC MATERIALS, 1997, 26 (04) : 402 - 409
  • [45] Chemical deposition and characterization of copper indium diselenide (CISe) thin films
    Pathan, HM
    Lokhande, CD
    APPLIED SURFACE SCIENCE, 2005, 245 (1-4) : 328 - 334
  • [46] Preparation and characterization of ZnS thin films prepared by chemical bath deposition
    Wei, Aixiang
    Liu, Jun
    Zhuang, Mixue
    Zhao, Yu
    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2013, 16 (06) : 1478 - 1484
  • [47] Chemical solution deposition (CSD) and characterization of ferroelectric and dielectric thin films
    Symetrix Corp, Colorado Springs, United States
    Integr Ferroelectr, 1 -4 pt 2 (1-11):
  • [48] Deposition and Characterization of CIGS Thin Films Deposited by Chemical Spray Process
    Zhang, Yujie
    Jun, Hoyoung
    Park, Jae Young
    Park, Seon Young
    Ryu, Sang Ouk
    Ryu, Si Ok
    MOLECULAR CRYSTALS AND LIQUID CRYSTALS, 2015, 617 (01) : 186 - 194
  • [49] Characterization of lead oxide thin films produced by chemical vapor deposition
    Madsen, LD
    Weaver, L
    JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1998, 81 (04) : 988 - 996
  • [50] Chemical deposition of thallium doped cadmium selenide thin films and their characterization
    Hankare, PP
    Jadhav, AD
    Bhuse, VM
    Khomane, AS
    Garadkar, KM
    MATERIALS CHEMISTRY AND PHYSICS, 2003, 80 (01) : 102 - 107