Effects of crystallization temperature on the stress of NiTi thin films

被引：11
|
作者：
Lee, H. -J. [2 ]
Huang, X. [1 ]
Mohanchandra, K. P. [3 ]
Carman, G. [3 ]
Ramirez, A. G. [1 ,4 ]
机构：
[1] Yale Univ, Dept Mech Engn, New Haven, CT 06520 USA
[2] Sungkyunkwan Univ, Sch Adv Mat Sci & Engn, Kyonggi Do, South Korea
[3] Univ Calif Los Angeles, Dept Mech & Aerosp Engn, Los Angeles, CA 90095 USA
[4] MIT, Dept Mat Sci & Engn, Cambridge, MA 02139 USA
来源：
SCRIPTA MATERIALIA | 2009年 / 60卷 / 12期
基金：
美国国家科学基金会;
关键词：
Shape memory alloys; Thin films; Annealing; Phase transformations; Transmission electron microscopy (TEM); SHAPE-MEMORY ALLOY; MARTENSITIC-TRANSFORMATION; PHASE-TRANSFORMATIONS; SPUTTER-DEPOSITION; GRAIN-SIZE; TEM;
D O I：
10.1016/j.scriptamat.2009.02.054
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
We report the effects of crystallization temperature on the phase transformation behavior of NiTi thin films. With increasing crystallization temperature, the film stress during phase transformations drops sharply. Smaller grains were found as crystallization temperatures increased. These data suggest that, along with thermal stress, microstructure contributes to the phase transformation behavior, whereby smaller grains may suppress the conversion to martensite. This study illuminates the connection between processing, microstructure and phase transformation behavior for these technologically important materials. (C) 2009 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.
引用
收藏
页码：1133 / 1136
页数：4
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