Ferrofluidic masking of solid state nuclear track detectors during etching

被引：6

作者：

Springham, S. V. ^{[1
]}

Malik, F. ^{[2
]}

Roshan, M. V. ^{[1
]}

Talebitaher, A. R. ^{[1
]}

Rawat, R. S. ^{[1
]}

Lee, P. ^{[1
]}

机构：

[1] Nanyang Technol Univ, Natl Inst Educ, Singapore 637616, Singapore

[2] PINSTECH, Radiat Phys Div, Islamabad, Pakistan

来源：

RADIATION MEASUREMENTS | 2009年 / 44卷 / 02期

关键词：

CR-39; Etch mask; Bulk etch rate; Ferrofluid; CR-39; FUSION;

D O I：

10.1016/j.radmeas.2009.01.007

中图分类号：

TL [原子能技术]; O571 [原子核物理学];

学科分类号：

0827 ; 082701 ;

摘要：

This work presents a novel method for determining bulk etch rate of CR-39 during prolonged etching by masking the surface with a ferrofluidic film held in position by magnetostatic forces. The CR-39 etching conditions were 6.25 M NaOH solution for 24 h at temperatures ranging from 50 to 80 degrees C. After etching, the heights of the resulting un-etched plateaus were measured using a Talyscan 150 profilometer. The removed layer thicknesses ranged from 12 to 85 mu m, giving corresponding bulk etch rates in the range 0.5-3.54 mu m/h. (C) 2009 Elsevier Ltd. All rights reserved.

引用

页码：173 / 175

页数：3

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