Ferrofluidic masking of solid state nuclear track detectors during etching

被引:6
|
作者
Springham, S. V. [1 ]
Malik, F. [2 ]
Roshan, M. V. [1 ]
Talebitaher, A. R. [1 ]
Rawat, R. S. [1 ]
Lee, P. [1 ]
机构
[1] Nanyang Technol Univ, Natl Inst Educ, Singapore 637616, Singapore
[2] PINSTECH, Radiat Phys Div, Islamabad, Pakistan
关键词
CR-39; Etch mask; Bulk etch rate; Ferrofluid; CR-39; FUSION;
D O I
10.1016/j.radmeas.2009.01.007
中图分类号
TL [原子能技术]; O571 [原子核物理学];
学科分类号
0827 ; 082701 ;
摘要
This work presents a novel method for determining bulk etch rate of CR-39 during prolonged etching by masking the surface with a ferrofluidic film held in position by magnetostatic forces. The CR-39 etching conditions were 6.25 M NaOH solution for 24 h at temperatures ranging from 50 to 80 degrees C. After etching, the heights of the resulting un-etched plateaus were measured using a Talyscan 150 profilometer. The removed layer thicknesses ranged from 12 to 85 mu m, giving corresponding bulk etch rates in the range 0.5-3.54 mu m/h. (C) 2009 Elsevier Ltd. All rights reserved.
引用
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页码:173 / 175
页数:3
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