Helium bubble formation in nuclear glass by in-situ TEM ion implantation

被引：23
|
作者：
Gutierrez, G. [1 ]
Peuget, S. [1 ]
Hinks, J. A. [2 ]
Greaves, G. [2 ]
Donnelly, S. E. [2 ]
Oliviero, E. [3 ]
Jegou, C. [1 ]
机构：
[1] CEA, DEN, Lab Etud Mat & Proc Actif, F-30207 Bagnols Sur Ceze, France
[2] Univ Huddersfield, Sch Comp & Engn, Electron Microscopy & Mat Anal Grp, Huddersfield HD1 3DH, W Yorkshire, England
[3] Univ Paris 11, CNRS IN2P3, Ctr Spectrometrie Nucl & Spectrometrie Masse, Orsay, France
来源：
JOURNAL OF NUCLEAR MATERIALS | 2014年 / 452卷 / 1-3期
基金：
英国工程与自然科学研究理事会;
关键词：
SOLUBILITY; HE;
D O I：
10.1016/j.jnucmat.2014.06.010
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The effect of helium implantation fluences on He bubble nucleation and growth mechanisms in nuclear borosilicate glass has been characterized using in-situ transmission electron microscopy experiments. Observations of implanted glass at 143 K indicate that a helium concentration of around 3 at.% is required to nucleate a significant density of nanosized bubbles. He bubble growth is observed for concentration higher than the number of host sites (>4 at.%). These results highlight the large capacity of the glassy network for incorporating helium atoms. (C) 2014 Elsevier B.V. All rights reserved.
引用
收藏
页码：565 / 568
页数：4
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