Evaluating films for high transmission attenuated phase shift masks

被引：3

作者：

Nemoto, Satoru ^{[1
]}

Komizo, Toru ^{[1
]}

Kikuchi, Yasutaka ^{[1
]}

Gallagher, Emily ^{[2
]}

Benz, Jason ^{[2
]}

Hibbs, Michael ^{[2
]}

Haraguchi, Takashi ^{[3
]}

机构：

[1] Toppan Elect Inc, 1000 River Rd, Essex Jct, VT 05452 USA

[2] IBM Microelect, Essex Jct, VT 05452 USA

[3] Toppan Printing Co LTD, Saitama 3528562, Japan

来源：

PHOTOMASK AND NEXT GENERATION LITHOGRAPHY MASK TECHNOLOGY XIII, PTS 1 AND 2 | 2006年 / 6283卷

关键词：

attenuated phase shift mask; high transmission; 45nm lithography;

D O I：

10.1117/12.681767

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Three types of high transmission attenuated phase shift masks were evaluated. The attenuating materials were obtained from commercial and non-commercial sources. Various key performance metrics were investigated. Blanket film transmission and reflection was measured at various wavelengths. Laser durability and cleaning durability were measured. Standard dry etch processes were used for each film and the profile and surface properties were compared. Final mask transmission and phase were also measured. The summarized results show clear benefits of using some high transmission materials relative to others.

引用

页数：8

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