Dy-Ni alloy metal ion source for focused ion beam implantation

被引：4
|
作者：
Melnikov, A [1 ]
Hillmann, M [1 ]
Kamphausen, I [1 ]
Oswald, W [1 ]
Stauche, P [1 ]
Wernhardt, R [1 ]
Wieck, AD [1 ]
机构：
[1] Ruhr Univ Bochum, Lehrstuhl Angew Festkorperphys, D-44780 Bochum, Germany
来源：
VACUUM | 2002年 / 67卷 / 02期
关键词：
liquid metal ion source; focused ion beam; Dysprosium ions;
D O I：
10.1016/S0042-207X(02)00270-1
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
A liquid metal ion source (LMIS) was fabricated on the basis of a eutectic Dy69Ni31 alloy for use in focused ion beam implantation. The main component of the ion beam is double charged Dysprosium. The electrical parameters of the LMIS are similar to those of a Ga and Au-Be-Si LMIS. (C) 2002 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码：249 / 251
页数：3
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