Structure, composition, and mechanical properties of thin films of transition metals diborides

被引：18
|
作者：
Goncharov, A. A. [1 ,3 ]
Dub, S. N. [2 ]
Agulov, A. V. [1 ,4 ,5 ]
Petukhov, V. V. [1 ,4 ,5 ]
机构：
[1] Donbass State Engn Acad, UA-83013 Kramatorsk, Donetsk Region, Ukraine
[2] Natl Acad Sci Ukraine, Bakul Inst Superhard Mat, UA-04074 Kiev, Ukraine
[3] Sumy State Univ, UA-40007 Sumy, Ukraine
[4] Natl Acad Sci, Sci Physicotechnol Ctr, UA-61022 Kharkov, Ukraine
[5] Minist Educ & Sci Ukraine, UA-61022 Kharkov, Ukraine
来源：
JOURNAL OF SUPERHARD MATERIALS | 2015年 / 37卷 / 06期
关键词：
thin films; nanoindentation; hardness; HfB2; TaB2; TI-B-N; SPUTTER-DEPOSITION; HARD COATINGS; MICROSTRUCTURE; BORIDES; ENERGY; LOAD;
D O I：
10.3103/S1063457615060076
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The effect of the deposition conditions on the structure, composition, and mechanical properties of thin films of diborides of transition metals that have been produced by high frequency magnetron sputtering. It has been shown that depending on the applied bias voltage and substrate temperature coatings of various structures are formed: from amorphous-like to nanocrystalline. Under the optimal energy conditions (bias voltage 50 V and substrate temperature 500A degrees C) superstoichiometric thin films of transition metals diborides of grain sizes 20-30 nm, hardness 44 GPa, and anomalously high recovering of the imprint depth have been produced.
引用
收藏
页码：422 / 428
页数：7
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