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- [31] Proton-Induced Displacement Damage and Total-Ionizing-Dose Effects on Silicon-Based MEMS ResonatorsIEEE TRANSACTIONS ON NUCLEAR SCIENCE, 2018, 65 (01) : 34 - 38Gong, Huiqi论文数: 0 引用数: 0 h-index: 0机构: Vanderbilt Univ, Dept Elect Engn & Comp Sci, 221 Kirkland Hall, Nashville, TN 37235 USA Vanderbilt Univ, Dept Elect Engn & Comp Sci, 221 Kirkland Hall, Nashville, TN 37235 USALiao, Wenjun论文数: 0 引用数: 0 h-index: 0机构: Vanderbilt Univ, Dept Elect Engn & Comp Sci, 221 Kirkland Hall, Nashville, TN 37235 USA Vanderbilt Univ, Dept Elect Engn & Comp Sci, 221 Kirkland Hall, Nashville, TN 37235 USAZhang, En Xia论文数: 0 引用数: 0 h-index: 0机构: Vanderbilt Univ, Dept Elect Engn & Comp Sci, 221 Kirkland Hall, Nashville, TN 37235 USA Vanderbilt Univ, Dept Elect Engn & Comp Sci, 221 Kirkland Hall, Nashville, TN 37235 USASternberg, Andrew L.论文数: 0 引用数: 0 h-index: 0机构: Vanderbilt Univ, Dept Elect Engn & Comp Sci, 221 Kirkland Hall, Nashville, TN 37235 USA Vanderbilt Univ, Dept Elect Engn & Comp Sci, 221 Kirkland Hall, Nashville, TN 37235 USAMcCurdy, Michael W.论文数: 0 引用数: 0 h-index: 0机构: Vanderbilt Univ, Dept Elect Engn & Comp Sci, 221 Kirkland Hall, Nashville, TN 37235 USA Vanderbilt Univ, Dept Elect Engn & Comp Sci, 221 Kirkland Hall, Nashville, TN 37235 USADavidson, Jim L.论文数: 0 引用数: 0 h-index: 0机构: Vanderbilt Univ, Dept Elect Engn & Comp Sci, 221 Kirkland Hall, Nashville, TN 37235 USA Vanderbilt Univ, Dept Elect Engn & Comp Sci, 221 Kirkland Hall, Nashville, TN 37235 USAReed, Robert A.论文数: 0 引用数: 0 h-index: 0机构: Vanderbilt Univ, Dept Elect Engn & Comp Sci, 221 Kirkland Hall, Nashville, TN 37235 USA Vanderbilt Univ, Dept Elect Engn & Comp Sci, 221 Kirkland Hall, Nashville, TN 37235 USAFleetwood, Daniel M.论文数: 0 引用数: 0 h-index: 0机构: Vanderbilt Univ, Dept Elect Engn & Comp Sci, 221 Kirkland Hall, Nashville, TN 37235 USA Vanderbilt Univ, Dept Elect Engn & Comp Sci, 221 Kirkland Hall, Nashville, TN 37235 USASchrimpf, Ronald D.论文数: 0 引用数: 0 h-index: 0机构: Vanderbilt Univ, Dept Elect Engn & Comp Sci, 221 Kirkland Hall, Nashville, TN 37235 USA Vanderbilt Univ, Dept Elect Engn & Comp Sci, 221 Kirkland Hall, Nashville, TN 37235 USAShuvra, Pranoy Deb论文数: 0 引用数: 0 h-index: 0机构: Univ Louisville, Dept Elect & Comp Engn, Louisville, KY 40292 USA Vanderbilt Univ, Dept Elect Engn & Comp Sci, 221 Kirkland Hall, Nashville, TN 37235 USA论文数: 引用数: h-index:机构:McNamara, Shamus论文数: 0 引用数: 0 h-index: 0机构: Univ Louisville, Dept Elect & Comp Engn, Louisville, KY 40292 USA Vanderbilt Univ, Dept Elect Engn & Comp Sci, 221 Kirkland Hall, Nashville, TN 37235 USAWalsh, Kevin M.论文数: 0 引用数: 0 h-index: 0机构: Univ Louisville, Dept Elect & Comp Engn, Louisville, KY 40292 USA Vanderbilt Univ, Dept Elect Engn & Comp Sci, 221 Kirkland Hall, Nashville, TN 37235 USAAlphenaar, Bruce W.论文数: 0 引用数: 0 h-index: 0机构: Univ Louisville, Dept Elect & Comp Engn, Louisville, KY 40292 USA Vanderbilt Univ, Dept Elect Engn & Comp Sci, 221 Kirkland Hall, Nashville, TN 37235 USAAlles, Michael L.论文数: 0 引用数: 0 h-index: 0机构: Vanderbilt Univ, Dept Elect Engn & Comp Sci, 221 Kirkland Hall, Nashville, TN 37235 USA Vanderbilt Univ, Dept Elect Engn & Comp Sci, 221 Kirkland Hall, Nashville, TN 37235 USA
- [32] Total dose ionizing irradiation effects on a static random access memory field programmable gate arrayJournal of Semiconductors, 2012, 33 (03) : 42 - 47论文数: 引用数: h-index:机构:余学峰论文数: 0 引用数: 0 h-index: 0机构: Xinjiang Technical Institute of Physics & Chemistry,Chinese Academy of Sciences Xinjiang Province Key Laboratory of Electronics Information Material and Device Xinjiang Technical Institute of Physics & Chemistry,Chinese Academy of Sciences论文数: 引用数: h-index:机构:李豫东论文数: 0 引用数: 0 h-index: 0机构: Xinjiang Technical Institute of Physics & Chemistry,Chinese Academy of Sciences Xinjiang Province Key Laboratory of Electronics Information Material and Device Xinjiang Technical Institute of Physics & Chemistry,Chinese Academy of Sciences孙静论文数: 0 引用数: 0 h-index: 0机构: Xinjiang Technical Institute of Physics & Chemistry,Chinese Academy of Sciences Xinjiang Province Key Laboratory of Electronics Information Material and Device Xinjiang Technical Institute of Physics & Chemistry,Chinese Academy of Sciences论文数: 引用数: h-index:机构:论文数: 引用数: h-index:机构:李明论文数: 0 引用数: 0 h-index: 0机构: Xinjiang Technical Institute of Physics & Chemistry,Chinese Academy of Sciences Xinjiang Province Kev Laboratory of Electronics Information Material and Device Xinjiang Technical Institute of Physics & Chemistry,Chinese Academy of Sciences
- [33] A Novel SGT MOSFET Based on Radiation-Hardening Technology and Its Total-Ionizing-Dose Radiation EffectsIEEE ELECTRON DEVICE LETTERS, 2024, 45 (07) : 1253 - 1256Mo, Weiye论文数: 0 引用数: 0 h-index: 0机构: Fudan Univ, Shanghai Inst Intelligent Elect & Syst, Sch Microelect, State Key Lab ASIC & Syst, Shanghai 200433, Peoples R China Fudan Univ, Shanghai Inst Intelligent Elect & Syst, Sch Microelect, State Key Lab ASIC & Syst, Shanghai 200433, Peoples R ChinaYe, Jun论文数: 0 引用数: 0 h-index: 0机构: Fudan Univ, Shanghai Inst Intelligent Elect & Syst, Sch Microelect, State Key Lab ASIC & Syst, Shanghai 200433, Peoples R China Wuxi China Resources Huajing Microelect Co Ltd, Wuxi 214061, Jiangsu, Peoples R China Fudan Univ, Shanghai Inst Intelligent Elect & Syst, Sch Microelect, State Key Lab ASIC & Syst, Shanghai 200433, Peoples R ChinaLiu, Haonan论文数: 0 引用数: 0 h-index: 0机构: Fudan Univ, Shanghai Inst Intelligent Elect & Syst, Sch Microelect, State Key Lab ASIC & Syst, Shanghai 200433, Peoples R China Fudan Univ, Shanghai Inst Intelligent Elect & Syst, Sch Microelect, State Key Lab ASIC & Syst, Shanghai 200433, Peoples R ChinaXiao, Xuan论文数: 0 引用数: 0 h-index: 0机构: Wuxi China Resources Huajing Microelect Co LTD, Wuxi 214061, Jiangsu, Peoples R China Fudan Univ, Shanghai Inst Intelligent Elect & Syst, Sch Microelect, State Key Lab ASIC & Syst, Shanghai 200433, Peoples R ChinaFan, Wenqi论文数: 0 引用数: 0 h-index: 0机构: Fudan Univ, Shanghai Inst Intelligent Elect & Syst, Sch Microelect, State Key Lab ASIC & Syst, Shanghai 200433, Peoples R China Fudan Univ, Shanghai Inst Intelligent Elect & Syst, Sch Microelect, State Key Lab ASIC & Syst, Shanghai 200433, Peoples R ChinaSong, Yang论文数: 0 引用数: 0 h-index: 0机构: Wuxi China Resources Huajing Microelect Co LTD, Wuxi 214061, Jiangsu, Peoples R China Fudan Univ, Shanghai Inst Intelligent Elect & Syst, Sch Microelect, State Key Lab ASIC & Syst, Shanghai 200433, Peoples R ChinaHuang, Wei论文数: 0 引用数: 0 h-index: 0机构: Fudan Univ, Shanghai Inst Intelligent Elect & Syst, Sch Microelect, State Key Lab ASIC & Syst, Shanghai 200433, Peoples R China Fudan Univ, Shanghai Inst Intelligent Elect & Syst, Sch Microelect, State Key Lab ASIC & Syst, Shanghai 200433, Peoples R ChinaWang, Tao论文数: 0 引用数: 0 h-index: 0机构: Wuxi Microelect Sci & Res Ctr, Wuxi 214125, Peoples R China Fudan Univ, Shanghai Inst Intelligent Elect & Syst, Sch Microelect, State Key Lab ASIC & Syst, Shanghai 200433, Peoples R ChinaZhang, Qingdong论文数: 0 引用数: 0 h-index: 0机构: Wuxi Microelect Sci & Res Ctr, Wuxi 214125, Peoples R China Fudan Univ, Shanghai Inst Intelligent Elect & Syst, Sch Microelect, State Key Lab ASIC & Syst, Shanghai 200433, Peoples R ChinaZhang, Debin论文数: 0 引用数: 0 h-index: 0机构: Shanghai Inst Space Power Sources, Shanghai 200245, Peoples R China Fudan Univ, Shanghai Inst Intelligent Elect & Syst, Sch Microelect, State Key Lab ASIC & Syst, Shanghai 200433, Peoples R ChinaZhang, D. W.论文数: 0 引用数: 0 h-index: 0机构: Fudan Univ, Shanghai Inst Intelligent Elect & Syst, Sch Microelect, State Key Lab ASIC & Syst, Shanghai 200433, Peoples R China Fudan Univ, Shanghai Inst Intelligent Elect & Syst, Sch Microelect, State Key Lab ASIC & Syst, Shanghai 200433, Peoples R China
- [34] Total dose ionizing irradiation effects on a static random access memory field programmable gate arrayJOURNAL OF SEMICONDUCTORS, 2012, 33 (03)Gao Bo论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Xinjiang Tech Inst Phys & Chem, Urumqi 830011, Peoples R China Xinjiang Prov Key Lab Elect Informat Mat & Device, Urumqi 830011, Peoples R China Chinese Acad Sci, Grad Univ, Beijing 100049, Peoples R China Chinese Acad Sci, Xinjiang Tech Inst Phys & Chem, Urumqi 830011, Peoples R ChinaYu Xuefeng论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Xinjiang Tech Inst Phys & Chem, Urumqi 830011, Peoples R China Xinjiang Prov Key Lab Elect Informat Mat & Device, Urumqi 830011, Peoples R China Chinese Acad Sci, Xinjiang Tech Inst Phys & Chem, Urumqi 830011, Peoples R ChinaRen Diyuan论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Xinjiang Tech Inst Phys & Chem, Urumqi 830011, Peoples R China Xinjiang Prov Key Lab Elect Informat Mat & Device, Urumqi 830011, Peoples R China Chinese Acad Sci, Xinjiang Tech Inst Phys & Chem, Urumqi 830011, Peoples R ChinaLi Yudong论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Xinjiang Tech Inst Phys & Chem, Urumqi 830011, Peoples R China Xinjiang Prov Key Lab Elect Informat Mat & Device, Urumqi 830011, Peoples R China Chinese Acad Sci, Xinjiang Tech Inst Phys & Chem, Urumqi 830011, Peoples R ChinaSun Jing论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Xinjiang Tech Inst Phys & Chem, Urumqi 830011, Peoples R China Xinjiang Prov Key Lab Elect Informat Mat & Device, Urumqi 830011, Peoples R China Chinese Acad Sci, Xinjiang Tech Inst Phys & Chem, Urumqi 830011, Peoples R ChinaCui Jiangwei论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Xinjiang Tech Inst Phys & Chem, Urumqi 830011, Peoples R China Xinjiang Prov Key Lab Elect Informat Mat & Device, Urumqi 830011, Peoples R China Chinese Acad Sci, Grad Univ, Beijing 100049, Peoples R China Chinese Acad Sci, Xinjiang Tech Inst Phys & Chem, Urumqi 830011, Peoples R ChinaWang Yiyuan论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Xinjiang Tech Inst Phys & Chem, Urumqi 830011, Peoples R China Xinjiang Prov Key Lab Elect Informat Mat & Device, Urumqi 830011, Peoples R China Chinese Acad Sci, Grad Univ, Beijing 100049, Peoples R China Chinese Acad Sci, Xinjiang Tech Inst Phys & Chem, Urumqi 830011, Peoples R ChinaLi Ming论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Xinjiang Tech Inst Phys & Chem, Urumqi 830011, Peoples R China Xinjiang Prov Key Lab Elect Informat Mat & Device, Urumqi 830011, Peoples R China Chinese Acad Sci, Xinjiang Tech Inst Phys & Chem, Urumqi 830011, Peoples R China
- [35] Experimental investigation on total-ionizing-dose radiation effects on the electrical properties of SOI-LIGBTSOLID-STATE ELECTRONICS, 2021, 175Yang, Guangan论文数: 0 引用数: 0 h-index: 0机构: Southeast Univ, Natl ASIC Syst Engn Res Ctr, Nanjing 210096, Peoples R China Southeast Univ, Natl ASIC Syst Engn Res Ctr, Nanjing 210096, Peoples R ChinaWu, Wangran论文数: 0 引用数: 0 h-index: 0机构: Southeast Univ, Natl ASIC Syst Engn Res Ctr, Nanjing 210096, Peoples R China Southeast Univ, Natl ASIC Syst Engn Res Ctr, Nanjing 210096, Peoples R ChinaZhang, Xingyao论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Xinjiang Tech Inst Phys & Chem, Key Lab Funct Mat & Devices Special Environm, Urumqi 830011, Peoples R China Southeast Univ, Natl ASIC Syst Engn Res Ctr, Nanjing 210096, Peoples R ChinaTang, Pengyu论文数: 0 引用数: 0 h-index: 0机构: Southeast Univ, Natl ASIC Syst Engn Res Ctr, Nanjing 210096, Peoples R China Southeast Univ, Natl ASIC Syst Engn Res Ctr, Nanjing 210096, Peoples R ChinaYang, Jing论文数: 0 引用数: 0 h-index: 0机构: Southeast Univ, Natl ASIC Syst Engn Res Ctr, Nanjing 210096, Peoples R China Southeast Univ, Natl ASIC Syst Engn Res Ctr, Nanjing 210096, Peoples R ChinaZhang, Long论文数: 0 引用数: 0 h-index: 0机构: Southeast Univ, Natl ASIC Syst Engn Res Ctr, Nanjing 210096, Peoples R China Southeast Univ, Natl ASIC Syst Engn Res Ctr, Nanjing 210096, Peoples R ChinaLiu, Siyang论文数: 0 引用数: 0 h-index: 0机构: Southeast Univ, Natl ASIC Syst Engn Res Ctr, Nanjing 210096, Peoples R China Southeast Univ, Natl ASIC Syst Engn Res Ctr, Nanjing 210096, Peoples R ChinaSun, Weifeng论文数: 0 引用数: 0 h-index: 0机构: Southeast Univ, Natl ASIC Syst Engn Res Ctr, Nanjing 210096, Peoples R China Southeast Univ, Natl ASIC Syst Engn Res Ctr, Nanjing 210096, Peoples R China
- [36] Total-Ionizing-Dose Effects on 3-D Sequentially Integrated FDSOI Ring OscillatorsIEEE TRANSACTIONS ON NUCLEAR SCIENCE, 2023, 70 (04) : 627 - 633Toguchi, Shintaro论文数: 0 引用数: 0 h-index: 0机构: Vanderbilt Univ, Dept Elect & Comp Engn, Nashville, TN 37235 USA Vanderbilt Univ, Dept Elect & Comp Engn, Nashville, TN 37235 USAZhang, En Xia论文数: 0 引用数: 0 h-index: 0机构: Vanderbilt Univ, Dept Elect & Comp Engn, Nashville, TN 37235 USA Vanderbilt Univ, Dept Elect & Comp Engn, Nashville, TN 37235 USAFleetwood, Daniel M.论文数: 0 引用数: 0 h-index: 0机构: Vanderbilt Univ, Dept Elect & Comp Engn, Nashville, TN 37235 USA Vanderbilt Univ, Dept Elect & Comp Engn, Nashville, TN 37235 USASchrimpf, Ronald D.论文数: 0 引用数: 0 h-index: 0机构: Vanderbilt Univ, Dept Elect & Comp Engn, Nashville, TN 37235 USA Vanderbilt Univ, Dept Elect & Comp Engn, Nashville, TN 37235 USAMoreau, Stephane论文数: 0 引用数: 0 h-index: 0机构: Univ Grenoble Alpes, CEA Leti, F-38000 Grenoble, France Vanderbilt Univ, Dept Elect & Comp Engn, Nashville, TN 37235 USABatude, Perrine论文数: 0 引用数: 0 h-index: 0机构: Univ Grenoble Alpes, CEA Leti, F-38000 Grenoble, France Vanderbilt Univ, Dept Elect & Comp Engn, Nashville, TN 37235 USA论文数: 引用数: h-index:机构:论文数: 引用数: h-index:机构:Alles, Michael L.论文数: 0 引用数: 0 h-index: 0机构: Vanderbilt Univ, Dept Elect & Comp Engn, Nashville, TN 37235 USA Vanderbilt Univ, Dept Elect & Comp Engn, Nashville, TN 37235 USA
- [37] Total-Ionizing-Dose Effects, Border Traps, and 1/f Noise in Emerging MOS TechnologiesIEEE TRANSACTIONS ON NUCLEAR SCIENCE, 2020, 67 (07) : 1216 - 1240Fleetwood, Daniel M.论文数: 0 引用数: 0 h-index: 0机构: Vanderbilt Univ, Elect Engn & Comp Sci Dept, 221 Kirkland Hall, Nashville, TN 37235 USA Vanderbilt Univ, Elect Engn & Comp Sci Dept, 221 Kirkland Hall, Nashville, TN 37235 USA
- [38] Total-Ionizing-Dose Effects in InGaAs MOSFETs With High-k Gate Dielectrics and InP SubstratesIEEE TRANSACTIONS ON NUCLEAR SCIENCE, 2020, 67 (07) : 1312 - 1319Bonaldo, Stefano论文数: 0 引用数: 0 h-index: 0机构: Vanderbilt Univ, Dept Elect & Comp Engn, 221 Kirkland Hall, Nashville, TN 37235 USA Univ Padua, Dept Informat Engn, I-35131 Padua, Italy Vanderbilt Univ, Dept Elect & Comp Engn, 221 Kirkland Hall, Nashville, TN 37235 USAZhang, En Xia论文数: 0 引用数: 0 h-index: 0机构: Vanderbilt Univ, Dept Elect & Comp Engn, 221 Kirkland Hall, Nashville, TN 37235 USA Vanderbilt Univ, Dept Elect & Comp Engn, 221 Kirkland Hall, Nashville, TN 37235 USAZhao, Simeng E.论文数: 0 引用数: 0 h-index: 0机构: Vanderbilt Univ, Dept Elect & Comp Engn, 221 Kirkland Hall, Nashville, TN 37235 USA Vanderbilt Univ, Dept Elect & Comp Engn, 221 Kirkland Hall, Nashville, TN 37235 USAPutcha, Vamsi论文数: 0 引用数: 0 h-index: 0机构: IMEC, B-3001 Leuven, Belgium Vanderbilt Univ, Dept Elect & Comp Engn, 221 Kirkland Hall, Nashville, TN 37235 USAParvais, Bertrand论文数: 0 引用数: 0 h-index: 0机构: IMEC, B-3001 Leuven, Belgium Vrije Univ Brussel, B-1050 Brussels, Belgium Vanderbilt Univ, Dept Elect & Comp Engn, 221 Kirkland Hall, Nashville, TN 37235 USALinten, Dimitri论文数: 0 引用数: 0 h-index: 0机构: IMEC, B-3001 Leuven, Belgium Vanderbilt Univ, Dept Elect & Comp Engn, 221 Kirkland Hall, Nashville, TN 37235 USA论文数: 引用数: h-index:机构:Paccagnella, Alessandro论文数: 0 引用数: 0 h-index: 0机构: Univ Padua, Dept Informat Engn, I-35131 Padua, Italy Vanderbilt Univ, Dept Elect & Comp Engn, 221 Kirkland Hall, Nashville, TN 37235 USAReed, Robert A.论文数: 0 引用数: 0 h-index: 0机构: Vanderbilt Univ, Dept Elect & Comp Engn, 221 Kirkland Hall, Nashville, TN 37235 USA Vanderbilt Univ, Dept Elect & Comp Engn, 221 Kirkland Hall, Nashville, TN 37235 USASchrimpf, Ronald D.论文数: 0 引用数: 0 h-index: 0机构: Vanderbilt Univ, Dept Elect & Comp Engn, 221 Kirkland Hall, Nashville, TN 37235 USA Vanderbilt Univ, Dept Elect & Comp Engn, 221 Kirkland Hall, Nashville, TN 37235 USAFleetwood, Daniel M.论文数: 0 引用数: 0 h-index: 0机构: Vanderbilt Univ, Dept Elect & Comp Engn, 221 Kirkland Hall, Nashville, TN 37235 USA Vanderbilt Univ, Dept Elect & Comp Engn, 221 Kirkland Hall, Nashville, TN 37235 USA
- [39] Gate Bias and Geometry Dependence of Total-Ionizing-Dose Effects in InGaAs Quantum-Well MOSFETsIEEE TRANSACTIONS ON NUCLEAR SCIENCE, 2017, 64 (01) : 239 - 244Ni, Kai论文数: 0 引用数: 0 h-index: 0机构: Vanderbilt Univ, Dept Elect Engn & Comp Sci, 221 Kirkland Hall, Nashville, TN 37235 USA Vanderbilt Univ, Dept Elect Engn & Comp Sci, 221 Kirkland Hall, Nashville, TN 37235 USAZhang, En Xia论文数: 0 引用数: 0 h-index: 0机构: Vanderbilt Univ, Dept Elect Engn & Comp Sci, 221 Kirkland Hall, Nashville, TN 37235 USA Vanderbilt Univ, Dept Elect Engn & Comp Sci, 221 Kirkland Hall, Nashville, TN 37235 USASchrimpf, Ronald D.论文数: 0 引用数: 0 h-index: 0机构: Vanderbilt Univ, Dept Elect Engn & Comp Sci, 221 Kirkland Hall, Nashville, TN 37235 USA Vanderbilt Univ, Dept Elect Engn & Comp Sci, 221 Kirkland Hall, Nashville, TN 37235 USAFleetwood, Daniel M.论文数: 0 引用数: 0 h-index: 0机构: Vanderbilt Univ, Dept Elect Engn & Comp Sci, 221 Kirkland Hall, Nashville, TN 37235 USA Vanderbilt Univ, Dept Elect Engn & Comp Sci, 221 Kirkland Hall, Nashville, TN 37235 USAReed, Robert A.论文数: 0 引用数: 0 h-index: 0机构: Vanderbilt Univ, Dept Elect Engn & Comp Sci, 221 Kirkland Hall, Nashville, TN 37235 USA Vanderbilt Univ, Dept Elect Engn & Comp Sci, 221 Kirkland Hall, Nashville, TN 37235 USAAlles, Michael L.论文数: 0 引用数: 0 h-index: 0机构: Vanderbilt Univ, Dept Elect Engn & Comp Sci, 221 Kirkland Hall, Nashville, TN 37235 USA Vanderbilt Univ, Dept Elect Engn & Comp Sci, 221 Kirkland Hall, Nashville, TN 37235 USALin, Jianqiang论文数: 0 引用数: 0 h-index: 0机构: MIT, Microsyst Technol Lab, 77 Massachusetts Ave, Cambridge, MA 02139 USA Vanderbilt Univ, Dept Elect Engn & Comp Sci, 221 Kirkland Hall, Nashville, TN 37235 USAdel Alamo, Jesus A.论文数: 0 引用数: 0 h-index: 0机构: MIT, Microsyst Technol Lab, 77 Massachusetts Ave, Cambridge, MA 02139 USA Vanderbilt Univ, Dept Elect Engn & Comp Sci, 221 Kirkland Hall, Nashville, TN 37235 USA
- [40] Total ionizing dose effects on graphene-based charge-trapping memoryScience China(Information Sciences), 2019, 62 (12) : 207 - 214Kai XI论文数: 0 引用数: 0 h-index: 0机构: Laboratory of Microelectronics Devices and Integrated Technology, Institute of Microelectronics,Chinese Academy of Sciences Laboratory of Microelectronics Devices and Integrated Technology, Institute of Microelectronics,Chinese Academy of SciencesJinshun BI论文数: 0 引用数: 0 h-index: 0机构: Laboratory of Microelectronics Devices and Integrated Technology, Institute of Microelectronics,Chinese Academy of Sciences School of Microelectronics, University of Chinese Academy of Sciences Laboratory of Microelectronics Devices and Integrated Technology, Institute of Microelectronics,Chinese Academy of SciencesSANDip MAJUMDAR论文数: 0 引用数: 0 h-index: 0机构: Laboratory of Microelectronics Devices and Integrated Technology, Institute of Microelectronics,Chinese Academy of Sciences Laboratory of Microelectronics Devices and Integrated Technology, Institute of Microelectronics,Chinese Academy of SciencesBo LI论文数: 0 引用数: 0 h-index: 0机构: Laboratory of Microelectronics Devices and Integrated Technology, Institute of Microelectronics,Chinese Academy of Sciences Laboratory of Microelectronics Devices and Integrated Technology, Institute of Microelectronics,Chinese Academy of SciencesJing LIU论文数: 0 引用数: 0 h-index: 0机构: Laboratory of Microelectronics Devices and Integrated Technology, Institute of Microelectronics,Chinese Academy of Sciences Laboratory of Microelectronics Devices and Integrated Technology, Institute of Microelectronics,Chinese Academy of SciencesYannan XU论文数: 0 引用数: 0 h-index: 0机构: Laboratory of Microelectronics Devices and Integrated Technology, Institute of Microelectronics,Chinese Academy of Sciences School of Microelectronics, University of Chinese Academy of Sciences Laboratory of Microelectronics Devices and Integrated Technology, Institute of Microelectronics,Chinese Academy of SciencesMing LIU论文数: 0 引用数: 0 h-index: 0机构: Laboratory of Microelectronics Devices and Integrated Technology, Institute of Microelectronics,Chinese Academy of Sciences Laboratory of Microelectronics Devices and Integrated Technology, Institute of Microelectronics,Chinese Academy of Sciences