Synthesis, fabrication and characterization of a highly-dispersive mirrors for the 2 μm spectral range

被引:11
|
作者
Amotchkina, Tatiana [1 ]
Trubetskov, Michael [1 ]
Habel, Florian [2 ]
Pervak, Yuri J. [3 ]
Zhang, Jinwei [1 ]
Mak, KaFai [1 ]
Pronin, Oleg [1 ]
Krausz, Ferenc [1 ,2 ]
Pervak, Vladimir [2 ]
机构
[1] Max Planck Inst Quantum Opt, Hans Kopfermann Str 1, D-85748 Garching, Germany
[2] Ludwig Maximilians Univ Munchen, Coulombwall 1, D-85748 Garching, Germany
[3] Taras Schevchenko Kiev Natl Univ, Volodymyrska Str 64, UA-01601 Kiev, Ukraine
来源
OPTICS EXPRESS | 2017年 / 25卷 / 09期
基金
欧盟地平线“2020”;
关键词
LASER APPLICATIONS; ULTRAFAST; SYSTEM;
D O I
10.1364/OE.25.010234
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We report a challenging design, fabrication and post-production characterization problem of a dispersive mirror supporting the spectral range from 2000 nm to 2200 nm and providing a group delay dispersion of -1000 fs(2). The absolute reflectance in the working range is over 99.95%. The reported mirror is a critical element for Tm and Ho based lasers and paves the way for the development of ultrafast 2 mu m lasers with sub-100 fs pulse duration. (C) 2017 Optical Society of America
引用
收藏
页码:10234 / 10240
页数:7
相关论文
共 50 条
  • [11] Design, fabrication and application of dispersive mirrors with a SiO2 sculptured layer
    Liu, Jia
    Wang, Yanzhi
    Zhao, Ruirui
    Guo, Kesheng
    Chen, Ruiyi
    Qi, Hongji
    Zhu, Meiping
    Wang, Ding
    Yi, Kui
    Leng, Yuxin
    Shao, Jianda
    OPTICAL MATERIALS EXPRESS, 2018, 8 (04): : 836 - 843
  • [12] Fabrication and characterization of EUV multilayer mirrors optimized for small spectral reflection bandwidth
    Y.C. Lim
    T. Westerwalbesloh
    A. Aschentrup
    O. Wehmeyer
    G. Haindl
    U. Kleineberg
    U. Heinzmann
    Applied Physics A, 2001, 72 : 121 - 124
  • [13] Fabrication and characterization of EUV multilayer mirrors optimized for small spectral reflection bandwidth
    Lim, YC
    Westermalbesloh, T
    Aschentrup, A
    Wehmeyer, O
    Haindl, G
    Kleineberg, U
    Heinzmann, U
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2001, 72 (01): : 121 - 124
  • [14] Optimization of Composition, Synthesis, and Study of Broadband Multilayer Mirrors for the EUV Spectral Range
    M. M. Barysheva
    S. A. Garakhin
    S. Yu. Zuev
    V. N. Polkovnikov
    N. N. Salashchenko
    M. V. Svechnikov
    R. M. Smertin
    N. I. Chkhalo
    E. Meltchakov
    Technical Physics, 2019, 64 : 1673 - 1679
  • [15] Optimization of Composition, Synthesis, and Study of Broadband Multilayer Mirrors for the EUV Spectral Range
    Barysheva, M. M.
    Garakhin, S. A.
    Zuev, S. Yu
    Polkovnikov, V. N.
    Salashchenko, N. N.
    Svechnikov, M., V
    Smertin, R. M.
    Chkhalo, N., I
    Meltchakov, E.
    TECHNICAL PHYSICS, 2019, 64 (11) : 1673 - 1679
  • [16] Highly reflective Ru/Y multilayer mirrors for the spectral range of 9-11 nm
    Polkovnikov, V. N.
    Shaposhnikov, R. A.
    Zuev, S. Yu
    Svechnikov, M., V
    Sertsu, M. G.
    Sokolov, A.
    Schafers, F.
    Chkhalo, N., I
    OPTICS EXPRESS, 2022, 30 (11) : 19332 - 19342
  • [17] Dispersive mirror for the mid-infrared spectral range of 9-11.5 μm
    Habel, Florian
    Pervak, Vladimir
    APPLIED OPTICS, 2017, 56 (04) : C71 - C74
  • [18] Controllable VO2 mirrors based on a three-mirror interferometer for the spectral range 0.5-2.5 μm
    Sidorov, AI
    JOURNAL OF OPTICAL TECHNOLOGY, 2000, 67 (06) : 532 - 536
  • [19] Design, fabrication and characterization of wire grid polarizers for the deep UV spectral range
    Rodriguez-de Marcos, Luis
    Leong, Ong Bin
    Asmara, Teguh Citra
    Heussler, Sascha Pierre
    Guerrero, Albert
    Mas, Roser
    Borrise, Xavier
    Breese, Mark B. H.
    Rusydi, Andrivo
    ADVANCES IN OPTICAL THIN FILMS VI, 2018, 10691
  • [20] Interference systems of controllable mirrors based on vanadium dioxide for the spectral range 0.6-10.6 μm
    Konovalova, OP
    Sidorov, AI
    Shaganov, II
    JOURNAL OF OPTICAL TECHNOLOGY, 1999, 66 (05) : 391 - 398