Preparation of thin silver films on mica studied by XRD and AFM

被引:35
|
作者
Grunwaldt, JD [1 ]
Atamny, F [1 ]
Gobel, U [1 ]
Baiker, A [1 ]
机构
[1] ETH ZENTRUM,DEPT CHEM ENGN & IND CHEM,CH-8092 ZURICH,SWITZERLAND
关键词
D O I
10.1016/0169-4332(95)00600-1
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Thin silver films (50-300 nm) were grown on muscovite mica at different substrate temperatures (480-600 K). The films were studied by XRD showing two different orientations. The single crystalline islands an preferentially oriented in [111] direction with a smaller quantity in [100] direction, which is also reflected by the morphology (determined by AFM) and by the oxygen content on the surface (detected by XPS). Both orientations could be traced back to two differently shaped islands: hexagonal-like flat particles and oval shaped higher ones. The orientation as well as the proportion between both species is strongly dependent on the temperature and the film thickness. In this way the conditions were optimized for preparing well-oriented thin films with large flat areas. Depending on the preparation of the films different oxygen contents were analyzed by XPS. Higher oxygen contents were found for samples with significant contributions of (100) planes.
引用
收藏
页码:353 / 359
页数:7
相关论文
共 50 条
  • [1] EPITAXIAL-GROWTH OF SILVER ON MICA AS STUDIED BY AFM AND STM
    BASKI, AA
    FUCHS, H
    [J]. SURFACE SCIENCE, 1994, 313 (03) : 275 - 288
  • [2] Evaporation of silver thin films on mica
    Levlin, M
    Laakso, A
    [J]. APPLIED SURFACE SCIENCE, 2001, 171 (3-4) : 257 - 264
  • [3] RECRYSTALLIZATION OF THIN SILVER FILMS ON MICA
    PASCARD, H
    SELLA, C
    HOFFMANN, F
    QUINTANA, C
    [J]. JOURNAL OF CRYSTAL GROWTH, 1971, 13 (MAY) : 225 - &
  • [4] AFM, XRD and HRTEM Studies of Annealed FePd Thin Films
    Perzanowski, M.
    Zabila, Y.
    Morgiel, J.
    Polit, A.
    Krupinski, M.
    Dobrowolska, A.
    Marszalek, M.
    [J]. ACTA PHYSICA POLONICA A, 2010, 117 (02) : 423 - 426
  • [5] Morphology of alkali halide thin films studied by AFM
    Golek, F
    Mazur, P
    Ryszka, Z
    Zuber, S
    [J]. SURFACE SCIENCE, 2006, 600 (08) : 1689 - 1696
  • [6] XRD and AFM studies of ZnS thin films produced by electrodeposition method
    Kassim, Anuar
    Nagalingam, Saravanan
    Min, Ho Soon
    Karrim, Noraini
    [J]. ARABIAN JOURNAL OF CHEMISTRY, 2010, 3 (04) : 243 - 249
  • [7] Reaction of Li with alloy thin films studied by in situ AFM
    Beaulieu, LY
    Hatchard, TD
    Bonakdarpour, A
    Fleischauer, MD
    Dahn, JR
    [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2003, 150 (11) : A1457 - A1464
  • [8] XAS, XRD, AFM and Raman studies of nickel tungstate electrochromic thin films
    Kuzmin, A
    Purans, J
    Kalendarev, R
    Pailharey, D
    Mathey, Y
    [J]. ELECTROCHIMICA ACTA, 2001, 46 (13-14) : 2233 - 2236
  • [9] Influence of the SHI Irradiation on the XRD, AFM, and Electrical Properties of CdSe Thin Films
    Singh, Rajesh
    Srinivasan, Radha
    [J]. JOURNAL OF NANO- AND ELECTRONIC PHYSICS, 2016, 8 (02)
  • [10] Characterization of thin films based on TiO2 by XRD, AFM and XPS measurements
    Wojcieszak, D.
    Domaradzki, J.
    Kaczmarek, D.
    Michalec, B.
    [J]. PROCEEDINGS OF 2008 INTERNATIONAL STUDENTS AND YOUNG SCIENTIST WORKSHOP PHOTONICS AND MICROSYSTEMS, 2008, : 96 - 99